单晶硅光学元件缺陷检测技术研究进展综述(特邀)

Research on defect detection technology of single crystal silicon optical components (invited)

  • 摘要: 单晶硅光学元件在加工和使用过程中容易产生表面及亚表面缺陷,这些缺陷对其光学性能、机械强度和使用寿命造成显著影响。具体而言,表面缺陷如划痕、麻点等会引起光散射和衍射,导致成像质量下降和激光损伤阈值降低;而亚表面缺陷则可能改变材料的折射率、机械强度和热稳定性,进一步影响元件的长期可靠性,因此,针对单晶硅光学元件表面及亚表面缺陷的检测技术研究具有重要的学术价值和实际意义。首先分析了单晶硅光学元件各类缺陷的形成机理、常见类型及其对元件性能的影响。随后,对当前几种主要的缺陷检测方法的研究现状和应用范围进行了综述。研究发现,缺陷检测技术仍面临诸多挑战,主要包括检测效率、深度分辨率以及复杂缺陷分类等问题。最后,对现有检测方法进行了系统总结,分析了不同缺陷检测方法的优缺点,并展望了未来的发展方向。

     

    Abstract:
    Significance  Monocrystalline silicon optical components, with their outstanding physical and optical properties, are widely used in optical systems, laser technology, and semiconductor devices. However, during the processing and use of monocrystalline silicon optical components, surface and subsurface defects are prone to occur, which have a significant impact on their optical performance, mechanical strength, and service life. Specifically, surface defects such as scratches and pockmarks can cause light scattering and diffraction, thereby reducing imaging quality and lowering the laser damage threshold. On the other hand, subsurface defects can alter the refractive index, mechanical strength, and thermal stability of materials, further affecting the long-term reliability of components. Therefore, the research on surface and subsurface defects of single-crystal silicon optical components holds significant academic value and practical significance.
    Progress  This research takes the defect detection technology of monocrystalline silicon optical components as the research object and systematically sorts out the detection methods and theories applicable to monocrystalline silicon materials. Firstly, the application background and detection requirements of single-crystal silicon optical components were expounded, and the formation mechanisms, common types, and their influences on the performance of various defects were analyzed. For instance, scratches are mostly caused by hard particles during the grinding and polishing process, while subsurface microcracks are often triggered by processing stress concentration. Subsequently, the research status and application scope of several major surface/subsurface defect detection methods were reviewed, including optical microscopy imaging, laser scattering, X-ray tomography, infrared transmission, and photoacoustic imaging techniques. The differences among them in terms of sensitivity, resolution, and applicable scenarios were compared.
    Conclusions and Prospects  Research has found that the detection technology for surface and subsurface defects of monocrystalline silicon optical components still faces many challenges, mainly including detection efficiency, depth resolution, and classification of complex defects. For instance, high-precision detection often sacrifices speed and is difficult to meet the demands of industrial online quality inspection. However, rapid detection methods are difficult to use for identifying deeply buried or minor defects. In addition, the morphologies of different defects are similar, resulting in a low accuracy rate of automatic recognition. Finally, the system summarized the existing detection methods, analyzed the advantages and disadvantages of different defect detection methods, and looked forward to the future development direction. It was proposed that the development of multimodal fusion detection and artificial intelligence-assisted recognition technology should be promoted to achieve high-precision, high-efficiency, and intelligent interpretation of defects, providing a theoretical basis and technical support for the high-precision manufacturing and application of monocrystalline silicon optical components.

     

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