[1]
|
|
[2]
|
|
[3]
|
Fleurov V B, Colon Ⅲ D J, O'Keeffe P, et al. Dual-chamber ultra line-narrowed excimer light source for 193nm lithography[C]//SPIE, 2003, 5040: 1694-1703. |
[4]
|
|
[5]
|
Gillespie Walter D, Toshihiko Ishihara, Partlo William N, et al. 6 kHz MOPA light source for 193nm immersion lithography[C]//SPIE, 2005, 5754: 1293-1303. |
[6]
|
|
[7]
|
Brown D J W, O'Keeffe P, Fleurov V B, et al. XLR500i: Recirculating ring ArF light source for immersion lithography[C]//SPIE, 2007, 6520: 652020. |
[8]
|
|
[9]
|
Vladimir Fleurov, Slava Rokitski, Robert Bergstedt, et al. XLR 600i: Recirculating ring ArF light source for double patterning immersion lithography[C]//SPIE, 2008, 6924: 69241R. |
[10]
|
Slava Rokitski, Vladimir Fleurov, Robert Bergstedt, et al. Enabling high volume manufacturing of double Patterning immersion lithography with the XLR600ix ArF light source[C]//SPIE, 2009, 7274: 72743O. |
[11]
|
|
[12]
|
|
[13]
|
Rostislav Rokitski, Toshi Ishihara, Rajeskar Rao, et al. High reliability ArF light source for double patterning immersion lithography[C]//SPIE, 2010, 7640: 76401Q. |
[14]
|
Rokitski R, Rafac R, Melchior J, et al. High power 120W ArF immersion XLR laser system for high dose applications[C]//SPIE, 2013, 8683: 86831H1-7. |
[15]
|
|
[16]
|
Li Tan, Chen Changle. Design and optimization of the XeCl excimer laser's stimuli circuit[J]. Infared and Laser Engineering, 2005, 34(5): 617-621. (in Chinese) |
[17]
|
|
[18]
|
|
[19]
|
You Libing,Zhou Yi,Liang Xu, et al. Recent development of ArF excimer laser technology for lithography[J]. Chinese Journal of Quantum Electronics, 2010, 27(5): 522-527. (in Chinese) |
[20]
|
|
[21]
|
Koji Kakizaki, Takashi Matsunaga, Yoichi Sasaki, et al. Ultra-high-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography[C]//SPIE, 2001, 4346: 1210-1218. |
[22]
|
Deng Guoqing, Liu Yong, He Longhai, et al. Optimization of gas performance of the compact excimer laser[J]. Laser Technology, 2010, 34(4): 529-531. (in Chinese) |
[23]
|
|
[24]
|
Koji Kakizaki, Yoichi Sasaki, Toyoharu Inoue. High-repetition-rate(6 kHz) and long-pulse-duration(50 ns) ArF excimer laser for sub-65nm lithography[J]. Review of Science Instruments, 2006, 77(3): 035109. |
[25]
|
|
[26]
|
Taylor R S. Preionization and discharge stability study of long optical pulse Duration UV-preionized XeCl lasers [J]. Appl Phys, 1986, B41(1): 1-24. |
[27]
|
|
[28]
|
Wakabayashi O, Enami T, Ohta T, et al. Billion-level durable ArF excimer laser with highly stable energy[C]//Microlithography'99, International Society for Optics and Photonics, 1999: 1058-1068. |
[29]
|
|
[30]
|
Kataoka N, Itagaki M, Uchino K, et al. Performance improvement of a discharge-pumped ArF excimer laser by xenon gas addition[J]. Japanese Journal of Applied Physics, 1999, 38(12R): 6735. |
[31]
|
|
[32]
|
|
[33]
|
Sumitani A, Andou S, Watanabe T, et al. Output stabilization technology with chemical impurity control on ArF excimer laser[C]//Microlithography 2000, International Society for Optics and Photonics, 2000: 1424-1434. |
[34]
|
|
[35]
|
Gower M C, Kearsley A, Webb C. Gas composition and lifetime studies of discharge excited rare-gas halide lasers[J]. IEEE Journal of Quantum Electronics, 1980, 16(2): 231-235. |
[36]
|
|
[37]
|
Song Jian, Zhu Peng, Zhang Wenya, et al. The principle and application of Cymer excimer laser[J]. EPE, 2008, 162: 60-62. (in Chinese) |
[38]
|
|
[39]
|
Dzakowic G, Wutzke S A. High-pulse-rate glow-discharge stabilization by gas flow[J]. Appl Phys, 1973, 44(11): 5061-5063. |
[40]
|
Kevin O'Brien, Dunstan Wayne J, Riggs Daniel J, et al. Performance demonstration of significant availability improvement in lithography light sources using GLX control system[C]//SPIE, 2008, 6924: 69242Q. |
[41]
|
|
[42]
|
O'Brien K, Riggs D J, Thornes J, et al. Field performance availability improvements in lithography light sources using the iGLX Gas Management System[C]//SPIE, 2012: 83261O-83261O-9. |
[43]
|
|
[44]
|
Ogura S, Kawakubo Y, Sasaki K, et al. Output power stabilization of a XeCl excimer laser by HCl gas injection[C]//SPIE, 1991, 1412: 123-128. |
[45]
|
|
[46]
|
Yu Yinshan, You Libing, Liang Xu, et al. Progress of excimer lasers technology[J]. Chinese Journal of Lasers, 2010, 37(9): 2253-2270. |