波前分割DOE阵列半导体激光器光束的品字形整形

石振东; 李淼峰; 邱传凯; 姚军; 周崇喜

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波前分割DOE阵列半导体激光器光束的品字形整形

石振东, 李淼峰, 邱传凯, 姚军, 周崇喜

文章导航 > 红外与激光工程 > 2013 > 42(3): 616-620

石振东, 李淼峰, 邱传凯, 姚军, 周崇喜. 波前分割DOE阵列半导体激光器光束的品字形整形[J]. 红外与激光工程, 2013, 42(3): 616-620.

引用本文:

石振东, 李淼峰, 邱传凯, 姚军, 周崇喜. 波前分割DOE阵列半导体激光器光束的品字形整形[J]. 红外与激光工程, 2013, 42(3): 616-620.

Shi Zhendong, Li Miaofeng, Qiu Chuankai, Yao Jun, Zhou Chongxi. Shaping laser diode beam into three rectangles by a DOE array to divide input wavefront[J]. Infrared and Laser Engineering, 2013, 42(3): 616-620.

Citation:

Shi Zhendong, Li Miaofeng, Qiu Chuankai, Yao Jun, Zhou Chongxi. Shaping laser diode beam into three rectangles by a DOE array to divide input wavefront[J]. Infrared and Laser Engineering, 2013, 42(3): 616-620.

波前分割DOE阵列半导体激光器光束的品字形整形

1.
中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209;
2.
中国科学院大学,北京100049

基金项目:

中国科学院功能晶体与激光技术重点实验室开放课题

详细信息

作者简介:
石振东（1985- ），男，博士生，主要从事微光学应用方面的研究。Email：likeszd8@163.com；周崇喜（1970- ），男，研究员，主要从事微纳光学元件及其在激光技术中的应用方面的研究。Email：cxzhou@ioe.ac.cn

石振东（1985- ），男，博士生，主要从事微光学应用方面的研究。Email：likeszd8@163.com；周崇喜（1970- ），男，研究员，主要从事微纳光学元件及其在激光技术中的应用方面的研究。Email：cxzhou@ioe.ac.cn

中图分类号: O436.1

Shaping laser diode beam into three rectangles by a DOE array to divide input wavefront

1.
State Key Laboratory of Optical Technologies for Micro-fabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China;
2.
University of Chinese Academy of Sciences,Beijing 100049,China

摘要: 半导体激光器（LD）输出光束受工作电流、个体差异的影响，发散角、输出光强出现波动。常规衍射光学元件（DOE）的激光光束整形设计只针对特定的输入输出光场，使用宽容度比较小。文中在LD 的整形中利用DOE 阵列化的处理，输入光场被分割成许多小单元，不同强度的光重新在成像平面内预定的区域内叠加，实现对光束的整形。用均匀平面波设计阵列DOE 每个单元，把高斯分布的球面波整形成品字形光强分布，衍射效率为90.53%，均匀性大约为96%；发散角在快、慢轴方向上2~16的范围内变化，均匀性为95.8%以上、衍射效率为90%以上；在离焦量16 m 内，光束质量变化不大。阵列DOE 提高了LD 光束整形系统的稳定性。
- 阵列衍射光学元件 /
- LD 光束整形 /
- 变发散角 /
- 均匀性
Abstract: The intensity distribution and the divergence of the laser diode (LD) output beam are variable with the different operating current and individual differences. The design of conventional diffractive optical element(DOE) to shape LD beam depends on the intensity distribution of the LD input and output beam, so the tolerance for the input LD beam is very small. A DOE array was put forward to shape the LD beam into three rectangles. It consisted of many DOE units, and each DOE unit could shape the corresponding small segment wavefront into needed output shapes, and all light diffracted by all DOE units was super-positioned on the output plane. Using the above DOE array laser shaped method, three rectangles intensity distribution were realized from Gaussian beam with the diffraction efficiency of 90.5% and the uniformity of 96%. When the half divergence angle of the LD varied from 2to 16in slow and fast axis direction respectively, the diffraction efficiency maintain was approximate 90% and its uniformity was more than 95%. When the defocus of the lens to collimate LD beam varied from -16 m to 16 m,numerical experiments indicate that uniformity and the diffraction efficiency of the shaped beam by the DOE array do not vary. The stability of the LD beam shaping system is improved.
- DOE array /
- LD beam shaping /
- variable divergence angle /
- uniformity

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波前分割DOE阵列半导体激光器光束的品字形整形

1. 中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209;

2. 中国科学院大学,北京100049

作者简介:
石振东（1985- ），男，博士生，主要从事微光学应用方面的研究。Email：likeszd8@163.com；周崇喜（1970- ），男，研究员，主要从事微纳光学元件及其在激光技术中的应用方面的研究。Email：cxzhou@ioe.ac.cn

石振东（1985- ），男，博士生，主要从事微光学应用方面的研究。Email：likeszd8@163.com；周崇喜（1970- ），男，研究员，主要从事微纳光学元件及其在激光技术中的应用方面的研究。Email：cxzhou@ioe.ac.cn

收稿日期: 2012-07-05
修回日期: 2012-08-03
刊出日期: 2013-03-25

基金项目:

中国科学院功能晶体与激光技术重点实验室开放课题

中图分类号: O436.1

关键词:

摘要: 半导体激光器（LD）输出光束受工作电流、个体差异的影响，发散角、输出光强出现波动。常规衍射光学元件（DOE）的激光光束整形设计只针对特定的输入输出光场，使用宽容度比较小。文中在LD 的整形中利用DOE 阵列化的处理，输入光场被分割成许多小单元，不同强度的光重新在成像平面内预定的区域内叠加，实现对光束的整形。用均匀平面波设计阵列DOE 每个单元，把高斯分布的球面波整形成品字形光强分布，衍射效率为90.53%，均匀性大约为96%；发散角在快、慢轴方向上2~16的范围内变化，均匀性为95.8%以上、衍射效率为90%以上；在离焦量16 m 内，光束质量变化不大。阵列DOE 提高了LD 光束整形系统的稳定性。

English Abstract

Shaping laser diode beam into three rectangles by a DOE array to divide input wavefront

1. State Key Laboratory of Optical Technologies for Micro-fabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China;

2. University of Chinese Academy of Sciences,Beijing 100049,China

Received Date: 2012-07-05
Rev Recd Date: 2012-08-03
Publish Date: 2013-03-25

Keywords:

Abstract: The intensity distribution and the divergence of the laser diode (LD) output beam are variable with the different operating current and individual differences. The design of conventional diffractive optical element(DOE) to shape LD beam depends on the intensity distribution of the LD input and output beam, so the tolerance for the input LD beam is very small. A DOE array was put forward to shape the LD beam into three rectangles. It consisted of many DOE units, and each DOE unit could shape the corresponding small segment wavefront into needed output shapes, and all light diffracted by all DOE units was super-positioned on the output plane. Using the above DOE array laser shaped method, three rectangles intensity distribution were realized from Gaussian beam with the diffraction efficiency of 90.5% and the uniformity of 96%. When the half divergence angle of the LD varied from 2to 16in slow and fast axis direction respectively, the diffraction efficiency maintain was approximate 90% and its uniformity was more than 95%. When the defocus of the lens to collimate LD beam varied from -16 m to 16 m,numerical experiments indicate that uniformity and the diffraction efficiency of the shaped beam by the DOE array do not vary. The stability of the LD beam shaping system is improved.

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波前分割DOE阵列半导体激光器光束的品字形整形

Shaping laser diode beam into three rectangles by a DOE array to divide input wavefront

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波前分割DOE阵列半导体激光器光束的品字形整形

1. 中国科学院光电技术研究所 微细加工光学技术国家重点实验室,四川成都610209; 2. 中国科学院大学,北京100049

English Abstract

Shaping laser diode beam into three rectangles by a DOE array to divide input wavefront

1. State Key Laboratory of Optical Technologies for Micro-fabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China; 2. University of Chinese Academy of Sciences,Beijing 100049,China

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目录

1. 中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川成都610209;

2. 中国科学院大学,北京100049

1. State Key Laboratory of Optical Technologies for Micro-fabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China;

2. University of Chinese Academy of Sciences,Beijing 100049,China