深紫外光刻投影物镜的三维偏振像差

贺文俊; 贾文涛; 冯文田; 郑阳; 刘智颖; 付跃刚

doi:10.3788/IRLA201847.0818006

深紫外光刻投影物镜的三维偏振像差

doi: 10.3788/IRLA201847.0818006

1.
长春理工大学光电工程学院,吉林长春 130022;
2.
中国人民解放军32142部队72分队,河北保定 071000

基金项目:

国家自然科学基金（11474037）;吉林省科技创新人才培育计划青年科研基金（20160520015JH）;吉林省优秀青年人才基金（20180520201JH）

详细信息

作者简介:
贺文俊(1987-),男,讲师,博士,主要从事偏振光学技术及应用方面的研究。Email:hewenjun@cust.edu.cn

中图分类号: TN305.7

Three-dimensional polarization aberration of deep ultraviolet lithographic projection lens

1.
School of Opto-electronic Engineering,Changchun University of Science and Technology,Changchun 130022,China;
2.
Branch 72 of No. 32142 Army,Baoding 071000,China

摘要: 深紫外光刻投影物镜是光刻机的核心部件，然而无论是照明光场偏振态的空间分布，还是光刻投影物镜自身的偏振像差都将改变光束的紧聚焦特性，对成像质量造成不可忽略的影响。基于三维琼斯矩阵，把偏振像差函数推广到三维空间，建立了三维相干光场中偏振像差的评价方法，并分析了典型的偏振敏感光学系统深紫外光刻投影物镜的三维偏振像差，详细阐述了其物理意义。研究发现：三维偏振像差函数的光瞳分布与视场、光学薄膜以及光学系统的自身结构密切相关。深入讨论了光学薄膜及偏振效应对光刻投影物镜成像质量的影响，进一步研究了照明光场的偏振态分布与光学系统波像差的关系，研究表明：光学薄膜引入的附加位相将导致光刻投影物镜的像质明显下降，而采用径向矢量光场照明可以改善成像质量。
- 偏振 /
- 光刻投影物镜 /
- 偏振像差 /
- 像质评价 /
- 波像差
Abstract: The deep ultraviolet lithography projection lens is the core component of the photolithography machine. However, whether the spatial distribution of the polarization state of the illumination field or the polarization aberration of the photolithography projection lens will change the compact focusing characteristic of the beam, which can not be neglected in the imaging quality. Based on the 3D Jones matrix, the polarization aberration functions were extended to the 3D space, and the evaluation method of polarization aberration for 3D coherent light field was established. The 3D polarization aberrations of the deep ultraviolet lithography projection objective, which was a typical polarization-sensitive optical system, were analyzed. And its physical significance was expounded in detail. It is found that the distributions of the 3D polarization functions in exit pupil are closely related to its own optical parameters, such as field of view, coatings and structural parameters. The effects of coatings and polarization effect on the imaging quality of lithography projection lens were discussed. And the relationships between the polarization distributions of the illuminated beam and the wavefront aberration of the optical system were further studied. The results show that the additional phase introduced by coatings leads to a significant decrease of the image quality for lithography projection lens, and the illumination by the radially vector beam can improve the image quality.
- polarization /
- lithographic projection lens /
- polarization aberration /
- image quality evaluation /
- wavefront aberration

[1]	McIntyre G R, Kye J, Levinson H. Polarization aberrations in hyper-numerical-aperture projection printing:a comparison of various representations[J]. J Microlithogr Microfabr Microsyst, 2006, 5(3):033001.
[2]	Yao Changcheng, Gong Yan. Research on temperature distribution of deep ultraviolet lithographic projection objective[J]. Chinese Journal of Lasers, 2016, 43(5):0516001. (in Chinese)
[3]	Kye J, McIntyre G R, Norihiro Y, et al. Polarization aberration analysis in optical lithography systems[C]//SPIE, 2006, 6154:61540E.
[4]	Geh B, Ruoff J, Zimmermann J, et al. The impact of projection lens polarization properties on lithographic process at hyper-NA[C]//SPIE, 2007, 6520:65200F.
[5]	Ruoff J, Totzeck M. Using orientation Zernike polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components[C]//SPIE, 2010, 7652:76521T.
[6]	Wang Xia, Xia Runqiu, Jin Weiqi, et al. Technology progress of infrared polarization imaging detection[J]. Infrared and Laser Engineering, 2014, 43(10):3175-3182. (in Chinese)
[7]	Yamamoto N, Kye J, Levinson H J. Polarization aberration analysis using Pauli-Zernike representation in:proceedings of the advanced lithography[C]//SPIE, 2007, 6520:65200Y.
[8]	Zhou Qiang, Zhao Jufeng, Feng Huajun, et al. Infrared image enhancement using polarization imaging[J]. Infrared and Laser Engineering, 2014, 43(1):39-47. (in Chinese)
[9]	Xu X, Huang W, Xu M. Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems[J]. Optics Express, 2015, 23(21):27911-27919.
[10]	Chipman R A. Mechanics of polarization ray tracing[J]. Opt Eng, 1995, 34:1636-1645.
[11]	Li S F. Jones-matrix analysis with Pauli-matrices:application to ellipsometry[J]. JOSA A, 2000, 17(5):920-926.
[12]	He W J, Fu Y G, Liu Z Y, et al. Three-dimensional polarization aberration functions in optical system based on three-dimensional polarization ray-tracing calculus[J]. Optics Communications, 2017, 387:128-134.
[13]	McGuire J P, Chipman R A. Polarization aberrations. 1. Rotationally symmetric optical systems[J]. Applied Optics, 1994, 33(22):5080-5100.
[14]	McGuire J P, Chipman R A, Polarization aberrations. 2. Tilted and decentered optical systems[J]. Applied Optics, 1994, 33(22):5101-5107.
[15]	Wang J, Li Y. Three-dimensional polarization aberration in hyper-numerical aperture lithography optics[C]//SPIE, 2012, 8326:832624.
[16]	Yun G, Crabtree K, Chipman R A. Three-dimensional polarization ray-tracing calculus I:definition and diattenuation[J]. Applied Optics, 2011, 50(18):2855-2865.
[17]	Yun G, Crabtree K, Chipman R A. Three-dimensional polarization ray-tracing calculus Ⅱ:retardance[J]. Applied Optics, 2011, 50(18):2866-2874.
[18]	He W J, Fu Y G, Zheng Y, et al. Polarization properties of a corner-cube retroreflector with three dimensional polarization ray-tracing calculus[J]. Applied Optics, 2013, 52(19):4527-4530.

[1]	王文悦, 李劲松, 郭纪祥, 吕家琪. 偏振态纵向变化矢量光束研究进展（特邀） . 红外与激光工程, 2023, 52(8): 20230362-1-20230362-10. doi: 10.3788/IRLA20230362
[2]	薛志鹏, 丛杉珊, 孙美娇, 张雷, 刘金全, 于鑫. 空间相机波像差灵敏度及集成仿真方法 . 红外与激光工程, 2022, 51(11): 20220109-1-20220109-7. doi: 10.3788/IRLA20220109
[3]	王伟平, 于佳睿, 胡小燕, 赵少宇. 中波红外集成偏振光栅结构参数对偏振性能影响仿真分析 . 红外与激光工程, 2021, 50(11): 20210132-1-20210132-8. doi: 10.3788/IRLA20210132
[4]	刘智颖, 吕知洋, 高柳絮. 红外显微光学系统的小像差互补设计方法 . 红外与激光工程, 2021, 50(2): 20200153-1-20200153-7. doi: 10.3788/IRLA20200153
[5]	付跃刚, 朱启凡, 张玉慧, 杨博伟, 刘智颖, 胡源. 仿生虾蛄眼偏振特性结构研究(简讯) . 红外与激光工程, 2019, 48(8): 827001-0827001(4). doi: 10.3788/IRLA201948.0827001
[6]	黄春晖, 翟晟. 用Stokes参量法研究角锥棱镜的偏振特性 . 红外与激光工程, 2018, 47(8): 818007-0818007(7). doi: 10.3788/IRLA201847.0818007
[7]	阴刚华, 栗孟娟, 李凌, 金忠瑞, 王兆明, 王向东. 低温真空环境光学系统波像差测试方法 . 红外与激光工程, 2018, 47(7): 717004-0717004(6). doi: 10.3788/IRLA201847.0717004
[8]	贺文俊, 贾文涛, 李亚红, 王祺, 付跃刚. 基于S波片和双延迟器的矢量光场偏振调控方法 . 红外与激光工程, 2018, 47(12): 1207001-1207001(8). doi: 10.3788/IRLA201847.1207001
[9]	陈卫, 孙晓兵, 乔延利, 陈震庭, 殷玉龙. 海面耀光背景下的目标偏振检测 . 红外与激光工程, 2017, 46(S1): 63-68. doi: 10.3788/IRLA201746.S117001
[10]	许雄, 陶强强, 沈飞, 郭忠义. 基于偏振信息恢复的光通信 . 红外与激光工程, 2016, 45(9): 922002-0922002(8). doi: 10.3788/IRLA201645.0922002
[11]	王新强, 孙晓兵, 张丽娟, 汪杰君, 谢秋蓉, 叶松. 可见/近红外土壤湿度的光谱偏振特性实验研究 . 红外与激光工程, 2015, 44(11): 3288-3292.
[12]	李文胜, 张琴, 黄海铭, 付艳华. 一维含单负材料光子晶体塔姆态的偏振特征 . 红外与激光工程, 2014, 43(5): 1600-1604.
[13]	裘桢炜, 洪津. 偏振遥感器镜头相位延迟特性分析 . 红外与激光工程, 2014, 43(3): 806-811.
[14]	周强, 赵巨峰, 冯华君, 徐之海, 李奇, 陈跃庭. 基于偏振成像的红外图像增强 . 红外与激光工程, 2014, 43(1): 39-47.
[15]	秦刚, 杨郁, 张建生. 船舰远程尾流散射光偏振特性的蒙特卡洛模拟 . 红外与激光工程, 2013, 42(7): 1730-1736.
[16]	孟祥盛. 偏振技术在激光引信抗烟雾干扰中的应用分析 . 红外与激光工程, 2013, 42(7): 1716-1719.
[17]	李培茂, 王霞, 金伟其, 李家琨, 顿雄. 双波段红外光学系统设计与像质评价 . 红外与激光工程, 2013, 42(11): 2882-2888.
[18]	李文胜, 张琴, 黄海铭, 付艳华, 是度芳. 含单负材料光子晶体隧穿模的偏振特性 . 红外与激光工程, 2012, 41(8): 2033-2037.
[19]	姜庆辉, 邱跃洪, 文延, 汪欢, 许维星. AOTF偏振光谱成像数据采集系统设计 . 红外与激光工程, 2012, 41(1): 218-222.
[20]	史广维, 张新, 张建萍, 何锋赟, 王灵杰. 几种失调反射光学系统的波像差特性 . 红外与激光工程, 2012, 41(1): 160-166.

点击查看大图

计量

文章访问数: 368
HTML全文浏览量: 42
PDF下载量: 60
被引次数: 0

姓名
邮箱
手机号码
标题
留言内容
验证码

留言板

深紫外光刻投影物镜的三维偏振像差

doi: 10.3788/IRLA201847.0818006

作者简介:
贺文俊(1987-),男,讲师,博士,主要从事偏振光学技术及应用方面的研究。Email:hewenjun@cust.edu.cn

Three-dimensional polarization aberration of deep ultraviolet lithographic projection lens

计量

深紫外光刻投影物镜的三维偏振像差

doi: 10.3788/IRLA201847.0818006

1. 长春理工大学光电工程学院,吉林长春 130022;

2. 中国人民解放军32142部队72分队,河北保定 071000

作者简介:
贺文俊(1987-),男,讲师,博士,主要从事偏振光学技术及应用方面的研究。Email:hewenjun@cust.edu.cn

English Abstract

Three-dimensional polarization aberration of deep ultraviolet lithographic projection lens

1. School of Opto-electronic Engineering,Changchun University of Science and Technology,Changchun 130022,China;

2. Branch 72 of No. 32142 Army,Baoding 071000,China

全文HTML

目录

留言板

深紫外光刻投影物镜的三维偏振像差

doi: 10.3788/IRLA201847.0818006

作者简介: 贺文俊(1987-),男,讲师,博士,主要从事偏振光学技术及应用方面的研究。Email:hewenjun@cust.edu.cn

Three-dimensional polarization aberration of deep ultraviolet lithographic projection lens

计量

出版历程

深紫外光刻投影物镜的三维偏振像差

doi: 10.3788/IRLA201847.0818006

1. 长春理工大学 光电工程学院,吉林 长春 130022; 2. 中国人民解放军32142部队72分队,河北 保定 071000

作者简介: 贺文俊(1987-),男,讲师,博士,主要从事偏振光学技术及应用方面的研究。Email:hewenjun@cust.edu.cn

English Abstract

Three-dimensional polarization aberration of deep ultraviolet lithographic projection lens

1. School of Opto-electronic Engineering,Changchun University of Science and Technology,Changchun 130022,China; 2. Branch 72 of No. 32142 Army,Baoding 071000,China

全文HTML

目录

作者简介:
贺文俊(1987-),男,讲师,博士,主要从事偏振光学技术及应用方面的研究。Email:hewenjun@cust.edu.cn

1. 长春理工大学光电工程学院,吉林长春 130022;

2. 中国人民解放军32142部队72分队,河北保定 071000

作者简介:
贺文俊(1987-),男,讲师,博士,主要从事偏振光学技术及应用方面的研究。Email:hewenjun@cust.edu.cn

1. School of Opto-electronic Engineering,Changchun University of Science and Technology,Changchun 130022,China;

2. Branch 72 of No. 32142 Army,Baoding 071000,China