[1] Pliskin W A. Comparison of properties of dielectric films deposited by various methods [J]. J Vac Sci Technol, 1977, 14(5): 1064-1081.
[2]
[3] Bin Fan, Masahiro Suzuki, Ken Tang. Ion-assisted deposition of TiO2/SiO2 multilayers for mass production [J]. Appl Opt, 2006, 45(7): 1461-1464.
[4]
[5]
[6] Klemberg-Sapieha, Jolanta E, Oberste-Berghaus, et al. Mechanical characteristics of optical coatings prepared by various techniques: a comparative study [J]. Appl Opt, 2004, 43(13): 2670-2679
[7]
[8] Eda Cetinrg, Bill Baloukas, Oleg Zabeida, et al. Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering [J]. Appl Opt, 2009, 43(23): 4536-4544.
[9]
[10] Wei D T. Ion beam interference coating for ultralow optical loss[J]. Appl Opt, 1989, 28(14): 2813-2816.
[11]
[12] Cetinrg E, Baloukas B, Zabeida O, et al. Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering[J]. Appl Opt, 2009, 48(23): 4536-4544.
[13] Jiang H Q, Wei Q, Cao Q X, et al. Spectroscopic ellipsometry characterization of TiO2 thin films prepared by the sol-gel method [J]. Ceramics International, 2008, (34): 1039-1042.
[14]
[15]
[16] Woollam J A Co., Inc. Guide to Using WVASE32 [Z]. Lincoln, NE, US: Woollam J A Co., Inc., 2008.
[17]
[18] Mathematics Handbook [M]. Beijing: Higher Education Press, 1979: 853-858. (in Chinese) 数学手册[M]. 北京: 高等教育出版社, 1979: 853-858.
[19]
[20] Stoney G G. The tension of metallic films deposited by electrolysis[J]. Proc R Soc A, 1909, 82: 172-175.
[21] He Shaohua, Wen Zhuqing, Lou Tao. Experimental Design and Data Processing [M]. Changsha: National University of Defense Technology Press, 2002: 62-92. (in Chinese) 何少华, 文竹青, 娄涛. 试验设计与数据处理[M]. 长沙: 国防科技大学出版社, 2002: 62-92.