[1] Lifshitz Y, Kasi S R, Tabalais J W, et al. Subplantation model for film growth from hyperthermal species [J]. Phys Rev B, 1990, 41: 10468-10480.
[2]
[3]
[4] .Davis C A. A simple model for the formation of compressive stress in thin films by ion bombardment[J]. Thin Solid Films, 1992, 226: 30-34.
[5] Pan Yongqiang, Wu Zhensen. Infrared optical properties of hydrogenated amorphous carbon films(a-C:H)[J]. Infrared and Laser Engineering, 2006, 35(6): 777-779. (in Chinese)
[6]
[7] Gioti M, Logothetidis S, Charitidis C. Stress relaxation and stability in thick amorphous carbon films deposited in layer structure [J]. Appl Phys Lett, 1998, 73: 184-186.
[8] 潘永强, 吴振森．含氢非晶碳膜(a-C:H)红外光学特性的研究[J]．红外与激光工程, 2006, 35(6): 777-779.
[9]
[10] Sheeja D, Tay B K, Lau S P, et al. Structural and tribological characterization of multilayer ta?鄄C films prepared by filtered cathodic vacuum arc with substrate pulse biasing[J]. Surf Coat Technol, 2000, 132: 228-232.
[11]
[12] Stoney G G. The tension of metallic films deposited electolysis[C]//Proc R Soc London Ser A, 1909, 82: 172-175.
[13] Logothetidis S, Gioti M, Charitidis C, et al. Stability, enhancement of elastic properties and structure of multilayered amorphous carbon films[J]. Appl Surf Sci, 1999, 138-139: 244-249.
[14]
[15]
[16] Friedmann T A, Sullivan J P, Knapp J A, et al. Thick stress?鄄free amorphous tetrahedral carbon films with hardness near that of diamond[J]. Appl Phys Lett, 1997, 71: 3820-3822.
[17] Ferrari A C, Robertson J. Interpretation of Raman spectra of disordered and amorphous carbon[J]. Phys Rev B, 2000, 61: 14095-14107.
[18]
[19] McCulloch D G, Xiao X L, Peng J L, et al. The structure and annealing properties of multilayer carbon films[J]. Surf Coating Techol, 2005, 198: 217-222.
[20]
[21] Zhang L H, Gong H, Wang J P. Kinetics and mechanisms of the thermal degradation of amorphous carbon films [J]. J Appl Phys, 2002, 91: 9646-9651.
[22]
[23] Pan Yongqiang, Wu Zhensen, Hang Lingxia, et al. Interface roughness of multilayer dielectric optical thin film[J]. Infrared and Laser Engineering, 2009, 38(3): 433-436. (in Chinese)
[24]
[25] Mcculloch D G, Peng J L, Mckenzie D R, et al. Mechanisms for the behavior of carbon films during annealing[J]. Phys Rev B, 2004, 70: 085406.
[26]
[27] Siegal M P, Tallant D R, Provencio P N, et al. Untrahard carbon nanocomposite films[J]. Appl Phys Lett, 2000, 76:3052-3054.
[28] 潘永强, 吴振森, 杭凌侠, 等．多层介质薄膜膜层间界面粗糙度及光散射[J]．红外与激光工程, 2009, 38(3): 433-436.
[29]
[30]
[31]