[1]
[2] Bu Yikun, Zhao Li, Zheng Quan. Design method of high damage threshold laser mirror[J]. Infrared and Laser Engineering, 2006, 35(2): 183-186. (in Chinese)
[3]
[4] Manfred Rahe, Reinhard Kunze, Holger Schmidt. Absorption and damage threshold of KCI and KBr at 10.6 m[C]//SPIE, 1992, 1624: 15-46.
[5]
[6] Ephstein E M. Scattering of electrons by phonons in a strong radiation field[J]. Sov Phys -JETP, 1970, 41(10): 2213-2217.
[7] Hu Jianping, Ma Ping, Xu Qiao. Damage threshold measurement of the optical elements[J]. Infrared and Laser Engineering, 2006, 35(2): 187-191. (in Chinese)
[8]
[9]
[10] Ni Xiaowu, Lu Jian, He Anzhi. Study of damage mechanism of optical dieleetric film by high power laser[J]. Laser Technology, 1994, 18(6): 348-351. (in Chinese)
[11]
[12] Huang Zuxin, Jiang Xiaodong, Ren Huan, et al. Study of laser conditioning influence on properties of optical films[J].High Power Laser And Particle Beams, 2004, 16(1): 23-26. (in Chinese)
[13]
[14] Kaiaer N, Anton B, Janchen H, et al. Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers[C]//SPIE, 1995, 2428: 400-409.
[15] Cui Yun, Zhao Yuanan, Jin Yunxia, et al. Influence of laser conditioning on laser induced damage threshold of antireflection layer[J]. Chinese Journal of Vacuum Science and Technology, 2006, 26(4): 321-325. (in Chinese)
[16]
[17]
[18] Li Xiao, Liu Xiaofeng, Zhao Yuan'an, et al. Influence of laser-conditioning on defects of SiO2 mono-layer films[J]. Chinese Journal of Lasers, 2010, 37(6): 1626-1630. (in Chinese)
[19] Wei Chaoyang, Zhao Yuanan, He Hongbo, et al. Laser conditioning on optical thin film components[J]. Laser Optoelectronics Progress, 2005, 42(5): 51-55. (in Chinese)