[1]
|
|
[2]
|
Sakharov V K. Model of lock-in in a ring laser and asemiconductor laser gyro[J]. Optics Quantum Electrics, 2011,56: 1135-1141. |
[3]
|
Accadia T, Acernese F, Antonucci F, et al. Performance of theVirgo interferometer longitudinal control system during thesecond science run[J]. Astroparticle Physics, 2011, 34: 521-527. |
[4]
|
|
[5]
|
Matsugi A, Miyoshi A. Kinetics of the self-reactions ofbenzyl and o-xylyl radicals studied by cavity ring-downspectroscopy[J]. Chem Phys Lett, 2012, 521: 26-30. |
[6]
|
|
[7]
|
|
[8]
|
George J, Knollenberg B. Dual ion beam sputteringdeposition for low loss mirrors [J]. Laser Focus World,2004, 40: 79-84. |
[9]
|
|
[10]
|
Tesar A A, Brown N J, Taylor J R, et al. Subsurfacepolishing damage of fused silica: Nature and effect on laserdamage of coated surfaces[C]//SPIE, 1990, 1441: 154-172. |
[11]
|
|
[12]
|
Jrg Steinert, Stefan Gliech, Andreas Wuttig, et al. Advancedmethods for surface and subsurface defect characterization ofoptical components [C]//SPIE, 2000, 4099: 290-298. |
[13]
|
Mimura H, Yumoto H, Matsuyama S, et al. Efficientfocusing of hard x rays to 25 nm by a total reflection mirror[J]. Applied Physics Letter, 2007, 90: 051903. |
[14]
|
|
[15]
|
Mimura1 H, Handa S, Kimura T, et al. Breaking the 10 nmbarrier in hard-X-ray focusing [J]. Nature Physics, 2010, 6:122-125. |
[16]
|
|
[17]
|
|
[18]
|
Kiontke S, Demmler M, Zeuner M, et al. Ion Beam Figuring(IBF) for high Precision Optics becomes affordable [C]//SPIE, 2010, 7786: 77860F. |
[19]
|
Paul R D, Donald G, StephenH, et al. System formagnetorheological finishing of substrates, US: US5951369A[P].1999-09-14. |
[20]
|
|
[21]
|
|
[22]
|
Kristian H. Apparatus for modifying the surface of the eyethrough large beam laser polishing and method of controllingthe apparatus[P]. US: US5683379A, 1997-11-04. |
[23]
|
|
[24]
|
Mori Y, Yamauchi K, Endo K. Elastic emission machining[J]. Precision Engineerings, 1987, 9(3): 123-128. |
[25]
|
|
[26]
|
Wysocki G, Dai S T, Brandstetter T, et al. Etching ofcrystalline Si in Cl2 atmosphere by means of an optical fibertip[J]. Applied Physics Letters, 2001, 79(2): 159-161. |
[27]
|
|
[28]
|
Kawazoe T, Kobayashi K, Takubo S, et al. Nonadiabaticphotodissociation process using an optical near fields[J]. TheJournal of Chemical Physics, 2005, 122: 024715. |
[29]
|
Yatsui T, Ohtsu M. Production of size-controlled Sinanocrystals using self-organized optical near-field chemicaletchings [J]. Applied Physics Letters, 2009, 95 (4): 043104-043104-3. |
[30]
|
|
[31]
|
Naruse M, Yatsui T, Nomura W, et al. Analysis of surfaceroughness of optical elements planarized by nonadiabaticoptical near-field etchings [J]. Journal of Applied Physics,2009, 105(6): 063516-063516-4. |
[32]
|
|
[33]
|
|
[34]
|
Takashi Y, Motoichi O. Nanophotonic fabrication in sub-nm scale[C]//SPIE, 2010, 7586: 75860D-1-75860D-8. |
[35]
|
|
[36]
|
Zhu Xing. Near-field optical and near-field optical microscope[J]. Journal of Peking University: Natural Science, 1997,33(3): 394-407. (in Chinese)朱星. 近场光学与近场光学显微镜[J]. 北京大学学报: 自然科学版, 1997, 33(3): 394-407. |
[37]
|
|
[38]
|
Yatsui T, Nomura W, Naruse M, et al. Realization of anatomically flat surface of diamond using dressed photon-phonon etchings [J]. Journal of Physics D: Applied Physics,2012, 45(47): 475302. |
[39]
|
|
[40]
|
Zhou Qin g, Zhu Xin, Li Hongfu. Intensity distribution ofprobe in the near-field optical [J]. Acta Physica Sinica,2000, 49(2): 210-214. (in Chinese)周庆, 朱星, 李宏福. 近场光学中光纤探针的光强分布[J].物理学报, 2000, 49(2): 210-214. |
[41]
|
Krug II J T, Snchez E J, Xie X S, et al. Design of near-field optical probes with optimal field enhancement by finitedifference time domain electromagnetic simulations [J]. TheJournal of Chemical Physics, 2002, 116: 10895. |