Research progress of high performance Sb-based superlattice mid-wave infrared photodetector (Invited)
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摘要: 中红外探测技术作为一种重要的被动探测手段,在各个领域都有着非常重要的作用。其中,以InAs/InAsSb超晶格材料为基础的无Ga型Sb化物II类超晶格探测器,由于去除了Ga原子的缺陷,具有更高的少子寿命,有利于提高探测器性能。此外,使用光子晶体结构,进行表面光学性能调控,可以提高器件的响应度,从而降低材料吸收区厚度,降低器件暗电流。暗电流的降低和响应度的提升,进一步优化了探测器的性能,进而提高器件工作温度,进一步降低探测系统的体积、重量和功耗。研究表明:使用光子晶体结构可以在不改变外延材料结构的前提下,提高器件量子效率,实现响应光谱的展宽,在实际应用中具有重要的意义。文中综述和讨论了InAs/InAsSb超晶格探测器和光子晶体结构探测器材料生长、结构设计的主要技术问题,详细介绍了两种提高中红外探测器性能的方案及国内外的研究进展。
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关键词:
- 锑化物 /
- 中红外探测技术 /
- 高工作温度 /
- InAs/InAsSb二类超晶格 /
- 光子晶体
Abstract: In recent year, mid-wave infrared detection technology has rapid development, and plays an important role in variable applications. Among different kinds of mid-infrared detectors, Ga-free InAs/InAsSb type II superlattice (T2 SL) detectors have the potential to achieve higher minority carrier lifetime and higher performance due to the removal of Ga-related defects. The application of photonic crystals is another way to improve the performance of detectors by optical control, such as the improvement of responsibility and the decrease of the dark current. With higher responsibility and lower dark current, the detector can have higher operating temperature, which results in low Size, Weight and Power (SWaP). At the same time, the photonic crystals can also realize the optimization of optical performance such as broadband spectrum responsibility without changing the material structure. The material growth and device design of InAs/InAsSb T2 SL detectors and photonic crystal structure detectors were reviewed and discussed in this paper. Two methods to improve the performance and the progress of mid-wave infrared detectors were introduced in detail. -
图 3 (a) InAs/AlAs/InAsSb II类超晶格势垒层能带结构; (b) InAs/InAsSb吸收层快门序列示意图; (c) InAs/AlAs/InAsSb势垒层快门序列示意图;(d) InAs/AlAs/InAsSb超晶格0级峰间距及Sb组分随Sb/As束流比变化曲线;(e) InAs/InAsSb超晶格材料高分辨率X射线衍射测试(蓝色)及模拟(红色)结果;(f)不同InAs/AlAs界面控制条件下5.6/2.2/5.6/7.5 mL InAs/AlAs/InAs/InAsSb超晶格材料各级卫星峰半峰宽[14]
Figure 3. (a) Band alignment of InAs/AlAs/InAsSb T2 SLs; (b) Shutter sequences used in InAs/InAsSb absorber growth; (c) Shutter sequences used in InAs/AlAs/InAsSb barrier growth; (d) The 0th diffraction peak and Sb component in InAs/AlAs/InAsSb SLs by varying the Sb/As flux ratio; (e) High-resolution X-ray diffraction (HRXRD) experimental (blue) and simulation (red) curve of the InAs/InAsSb SLs; (f) FWHM in HRXRD pattern of 5.6/2.2/5.6/7.5 mL InAs/AlAs/InAs/InAsSb SLs samples with different interfaces between InAs and AlAs layer[14]
图 5 (a) InAs/InAs0.45Sb0.55吸收区能带结构;(b) AlAs0.45Sb0.55/InAs0.45Sb0.55势垒层能带结构;(c) p+-B-n器件能带结构示意图;(d) p+-B-n器件暗电流密度在不同温度下随偏压变化曲线;(e)-100mV偏压下 p+-B-n器件暗电流密度随温度变化曲线[17]
Figure 5. (a) Band alignment of the InAs/InAs0.45Sb0.55 absorber; (b) Band alignment of the AlAs0.45Sb0.55/InAs0.45Sb0.55 barrier layer; (c) Schematic diagram of the p+-B-n device energy band structure; (d) Curves of dark current density with bias of the p+-B-n photodetectors at different temperature; (e) Dark current density of the p+-B-n photodetector under -100 mV applied bias [17]
图 7 (a) InGaAsSb/AlGaAsSb光子陷阱探测器结构;(b)陷光结构扫描电子显微镜形貌;(c)陷光结构整体设计图;光子陷阱探测器(红色)及不带陷光结构的探测器(黑色)在(d) 400~1600 nm波段及(e) 1.5~3 μm波段响应度;(f)暗电流密度随温度变化曲线[23]
Figure 7. (a) Structure of InGaAsSb/AlGaAsSb photodiodes with photon-trap arrays; (b) SEM image off photon-trap arrays; (c) Design of photon-trap arrays;Response of the photodiodes with (red) and without (black) photon-trap arrays at (d) 400-1600 nm and (e) 1.5-3 μm; (f) Dark current density at different temperature [23]
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