[1] Hu Zhonghua, Zhu Jing, Yang Baoxi, et al. Far-field multi-parameter measurement of diffractive optical element for pupilshaping in lithography system[J]. Chinese Journal of Lasers, 2013, 40(9):0908001. (in Chinese)胡中华, 朱菁, 杨宝喜, 等. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光, 2013, 40(9):0908001.
[2]

Dorodnyy A, Shklover V, Braginsky L, et al. High-efficiency spectrum splitting for solar photovoltaic[J]. Solar Energy Materials Solar Cells, 2015, 136(10):120-126.
[3]

Zhang L, Liu D, Shi T, et al. Practical and accurate method for aspheric misalignment aberrations calibration in non-null interferometer testing[J]. Applied Optics, 2013, 52(35):8501-8511.
[4] Zhang Wei, Gong Yan. Design of diffractive optical elements for off-axis illumination in projection lithography[J]. Opt Precision Eng, 2008, 16(11):2081-2086. (in Chinese)张巍, 巩岩. 投影光刻离轴照明用衍射光学元件设计[J]. 光学精密工程, 2008, 16(11):2081-2086.
[5] Song Qiang, Zhu Jing, Wang Jian. A mixed gradient algorithm for high performance DOE design in off axis lithography illumination system[J]. Acta Optica Sinica, 2015, 35(1):0122005. (in Chinese)宋强, 朱菁, 王健. 基于混合梯度下降的高性能光刻机离轴照明衍射光学元件设计[J]. 光学学报, 2015, 35(1):0122005.
[6] Zhang Wei, Liang Chuanyang, Li Jin, et al. Design of optical elements for beam shaping and unigorm illumination in laser digital projection display system[J]. Acta Optica Sinica, 2015, 35(1):0805001. (in Chinese)张巍, 梁传样, 李金, 等. 用于激光数字投影显示系统的匀光整形元件设计[J].光学学报, 2015, 35(1):0805001.
[7] Li Meixuan, Dong Lianhe. Light mode converter design in immersion lithography lighting system[J]. Infrared and Laser Engineering, 2018, 47(6):0618002. (in Chinese)李美萱, 董连和. 浸没式光刻照明系统的照明模式变换器[J]. 红外与激光工程, 2018, 47(6):0618002.
[8] Bao Haiting, Ouyang Mingzhao, Wang Zhiyong, et al. Design of light field shaping system based on DOE identification[J]. Journal of Changchun University of Science and Technology, 2017, 40(2):27-32. (in Chinese)包海廷, 欧阳名钊, 王志勇, 等. 基于DOE的标识光场整形系统设计[J]. 长春理工大学学报, 2017, 40(2):27-32.
[9]

Uzu H, Ichikawa M, Hino M, et al. High efficiency solar cells combining a perovskite and a silicon heterojunction solar cells visa an optical splitting system[J]. Appl Phys Lett, 2015, 106(1):013506-013510.
[10] Zhang Wei, Gong Yan. Vector analysis of diffractive optical elements for off axis illumination of projection lithographic system[J]. Acta Optica Sinica, 2011, 31(10):1005002. (in Chinese)张巍, 巩岩. 投影光刻离轴照明用衍射光学元件的矢量分析[J]. 光学学报, 2011, 31(10):1005002.
[11] Xing Shasha, Ran Yinghua, Jiang Haibo, et al. Illumination mode conversion system design based on micromirror array in lithography design[J]. Acta Optica Sinica, 2015, 35(11):102-111. (in Chinese)邢莎莎, 冉英华, 江海波, 等. 基于微反射镜阵列的光刻照明模式变换系统设计[J]. 光学学报, 2015, 35(11):102-111.