Volume 46 Issue 7
Aug.  2017
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Zhu Xubo, Li Mo, Chen Gang, Zhang Lixue, Cao Xiancun, Lv Yanqiu. Study on performance of InAlSb infrared photodiode[J]. Infrared and Laser Engineering, 2017, 46(7): 704002-0704002(5). doi: 10.3788/IRLA201746.0704002
Citation: Zhu Xubo, Li Mo, Chen Gang, Zhang Lixue, Cao Xiancun, Lv Yanqiu. Study on performance of InAlSb infrared photodiode[J]. Infrared and Laser Engineering, 2017, 46(7): 704002-0704002(5). doi: 10.3788/IRLA201746.0704002

Study on performance of InAlSb infrared photodiode

doi: 10.3788/IRLA201746.0704002
  • Received Date: 2016-11-11
  • Rev Recd Date: 2016-12-03
  • Publish Date: 2017-07-25
  • The InAlSb/InSb material of p-i-n structure was grown by Molecular Beam Epitaxy(MBE) on(100) InSb substrate. The current suppression effect of the barrier layer on the dark current was verified by growing a barrier layer with a wide gap between the absorber layer and the contact layer. The electrical properties of photodiode fabricated by InAlSb epitaxial material were compared with that of traditional InSb bulk material. When the external bias voltage is -0.1 V, the reverse bias current of p+-p+-n--n+ InAlSb device and p+-n--n+ InAlSb device is 3.410-6 Acm-2 and 7.810-6 Acm-2 at 77 K, respectively. The p+-p+-n--n+ InAlSb device suppresses the dark current at a very low level. It provides an important foundation for improving operating temperature of the infrared detector.
  • [1] Ashley T. Higher operating temperature, high performance infrared focal plane arrays[C]//SPIE, 2004, 5359:89-100.
    [2] Klin O. Molecular beam epitaxy grown In1-xAlxSb/InSb structures for infrared detectors[J]. J Vac Sci Technol B, 2006, 24(3):1607-1615.
    [3] Chen Gang, Sun Weiguo, Lv Yanqiu. Progress of high operating temperature InAlSb infrared detectors[J]. Infrared, 2016, 37(2):1-6. (in Chinese)陈刚, 孙维国, 吕衍秋. 高工作温度InAlSb红外探测器的研究进展[J]. 红外, 2016, 37(2):1-6.
    [4] Ashley T, Burke T M, Emeny M T, et al. Epitaxial InSb for elevated temperature operation of large IR focal[C]//SPIE, 2003, 5074:99-102.
    [5] Nesher O, Klipstein P C. High-performance IR detectors at SCD present and future[C]//SPIE, 2005, 5957:59570S.
    [6] Glozman A, Harush E, Jacobsohn E, et al. High per-formance InAlSb MWIR detectors operating at 100 K and beyond[C]//SPIE, 2006, 6206:62060M.
    [7] Mailhiot C, Smith D L. Long-wavelength infrared detectors based on strained InAs-Ga1-xInxSb Type-Ⅱ superlattices[J]. J Vac Sci Technol A, 1989, 7(2):445-449.
    [8] Shang Lintao, Liu Ming, Xing Weirong, et al. MBE growth and optimization of low Al component In1-xAlxSb film[J]. Laser Infrared, 2014, 44(10):1115-1118. (in Chinese)尚林陶, 刘铭, 邢伟荣, 等. 低Al组分In1-xAlxSb薄膜的MBE生长和优化[J]. 激光与红外, 2014, 44(10):1115-1118.
    [9] Liu Ming, Zhou Peng, Shang Lintao, et al. Research on quality of InAlSb/InSb crystal grown by molecular beam epitaxy[J]. Infrared, 2014, 35(11):15-19. (in Chinese)刘铭, 周朋, 尚林涛, 等. 分子束外延InAlSb/InSb晶体的质量研究[J]. 红外, 2014, 35(11):15-19.
    [10] Eftekhari G. Eletrical properties of sulfur-passivated Ⅲ-V compound devices[J]. Vacuum, 2002, 67(1):81-90.
    [11] Antoni Rogalski. Infrared Detectors[M]. Translated by Zhou Haixian, Cheng Yufang. Beijing:China Machine Press, 2014. (in Chinese)
    [12] Hood A, Razeghi M, Aifer E H, et al. On the performance and surface passivation of type Ⅱ InAs/GaSb superlattice photodiodes for the very-long-wavelength infrared[J]. Appl Phys Lett, 2005, 87(15):151113.
    [13] He Kai. Electrical Characterization technique of HgCdTe infrared photovoltaic detectors[D]. Beijing:University of Chinese Academy of Sciences, 2015:47-49. (in Chinese)何凯. 碲镉汞红外光伏探测器电学性能表征技术研究[D]. 北京:中国科学院大学, 2015:47-79.
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Study on performance of InAlSb infrared photodiode

doi: 10.3788/IRLA201746.0704002
  • 1. China Airborne Missile Academy,Luoyang 471009,China;
  • 2. Aviation Key Laboratory of Science and Technology on Infrared Detector,Luoyang 471009,China

Abstract: The InAlSb/InSb material of p-i-n structure was grown by Molecular Beam Epitaxy(MBE) on(100) InSb substrate. The current suppression effect of the barrier layer on the dark current was verified by growing a barrier layer with a wide gap between the absorber layer and the contact layer. The electrical properties of photodiode fabricated by InAlSb epitaxial material were compared with that of traditional InSb bulk material. When the external bias voltage is -0.1 V, the reverse bias current of p+-p+-n--n+ InAlSb device and p+-n--n+ InAlSb device is 3.410-6 Acm-2 and 7.810-6 Acm-2 at 77 K, respectively. The p+-p+-n--n+ InAlSb device suppresses the dark current at a very low level. It provides an important foundation for improving operating temperature of the infrared detector.

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