Design of high NA flat-field microscope objective for near infrared

Zhou Enyuan; Liu Lihui; Liu Yan; Cao Zhen

doi:10.3788/IRLA201746.0718006

Volume 46 Issue 7

Aug. 2017

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Zhou Enyuan, Liu Lihui, Liu Yan, Cao Zhen. Design of high NA flat-field microscope objective for near infrared[J]. Infrared and Laser Engineering, 2017, 46(7): 718006-0718006(7). doi: 10.3788/IRLA201746.0718006

Citation:

Zhou Enyuan, Liu Lihui, Liu Yan, Cao Zhen. Design of high NA flat-field microscope objective for near infrared[J]. Infrared and Laser Engineering, 2017, 46(7): 718006-0718006(7). doi: 10.3788/IRLA201746.0718006

Design of high NA flat-field microscope objective for near infrared

doi: 10.3788/IRLA201746.0718006

1.
Key Laboratory of Photoelectronic Imaging Technology and System,Ministry of Education of China,School of Optoelectronics,Beijing Institute of Technology,Beijing 100081,China

Received Date: 2016-11-05
Rev Recd Date: 2016-12-03
Publish Date: 2017-07-25

Abstract

To meet the requirements of femtosecond laser micro-nanofabrication systems for high precision and wide region, the features and design specifications of infinity microscope objectives which were important components of the systems were determined. Based on the theory of primary aberration of thin lens system, the conditions to meet were concluded to correct Petzval curvature and second order spectrum for femtosecond wavelength. The objective consisted of 11 spherical lens, and all materials were glass made in China, and the use of cemented lens composed of three lens was avoided. A near infrared flat-field microscope objective, whose working wavelength was 785-815 nm, numerical aperture was 0.9, field of view in image space was 22.5 mm, magnification was 40, was designed. Designing results show that the objective has excellent MTF, RMS wavefront errors of all fields are less than 0.08, and various geometrical aberrations are deeply under tolerances, the results meet the conditions of flat field and apochromatism, and energy concentration is high. Compensators are used to slacken material tolerance, manufacturing tolerances and alignment tolerances. RMS wavefront errors of all fields get less than 0.09 after tolerances attribution and the objective can be applied actually.
- optical design,
- microscope objective,
- flat field,
- femtosecond laser,
- micro-nanofabrication

References

[1]	Kawata S, Sun H B, Tanaka T, et al. Finer features for functional microdevices-micromachines can be created with higher resolution using two-photon absorption[J]. Nature,2001, 412(6848):697-698.
[2]	Dong Xianzi, Chen Weiqiang, Zhao Zhensheng, et al. Femtosecond pulse laser two-photon micro-nanofabrication technology and application[J]. Chinese Science Bulletin, 2008, 53(1):2-13. (in Chinese)董贤子, 陈卫强, 赵振声, 等. 飞秒脉冲激光双光子微纳加工技术及其应用[J]. 科学通报, 2008, 53(1):2-13.
[3]	Li Yan. The research of femtosecond laser micro-nanofabrication[D]. Changchun:Jilin University, 2010. (in Chinese)李岩. 飞秒激光微纳加工制备研究[D].长春:吉林大学, 2010.
[4]	Kuang Yuguang. Lens design of the flat field, apochromatic CF microscopic objective[J]. Acta Optica Sinica, 1994, 14(5):558-560. (in Chinese)匡裕光. 平象场复消色差大视场显微物镜光学设计[J]. 光学学报, 1994, 14(5):558-560.
[5]	Chen Jiao, Jiao Mingyin, Chang Weijun, et al. Optical design of apochromatic microscope objective for near ultraviolet-visible wide spectrum[J]. Journal of Applied Optics, 2011, 32(6):1098-1102. (in Chinese)陈姣, 焦明印, 常伟军, 等. 近紫外-可见光宽波段复消色差显微物镜设计[J]. 应用光学, 2011, 32(6):1098-1102.
[6]	Xue Jinlai, Gong Yan, Li Dianmeng. Optical design of the N.A. 0.75 plan-apochromatic microscope objective[J]. Chinese Optics, 2015, 8(6):957-963. (in Chinese)薛金来, 巩岩, 李佃蒙. N.A. 0.75平场复消色差显微物镜光学设计[J]. 中国光学, 2015, 8(6):957-963.
[7]	Miks A, Novak J. Method for primary design of superachromats[J]. Applied Optics, 2013, 52(28):6668-6876.
[8]	Liu Qian, Yang Weichuan, Yuan Daocheng, et al. Design of linear dispersive objective for chromatic confocal microscope[J]. Opt Precision Eng, 2013, 21(10):2473-2479. (in Chinese)刘乾, 杨维川, 袁道成, 等. 光谱共焦显微镜的线性色散物镜设计[J]. 光学精密工程, 2013, 21(10):2473-2479.
[9]	Meng Qingyu, Dong Jihong, Wang Dong, et al. Minitype optical system development of stereo camera[J]. Infrared and Laser Engineering, 2016, 45(4):0418002. (in Chinese)孟庆宇, 董吉洪, 王栋, 等.轻小型立体相机光学系统研制[J]. 红外与激光工程, 2016, 45(4):0418002.
[10]	Li Lin. Applied Optics[M]. Beijing:Beijing Institute of Technology Press, 2010. (in Chinese)李林. 应用光学[M]. 北京:北京理工大学出版社, 2010.
[11]	Liu Lipeng. The research of 3D micro-fabrication with two-photon absorption of femtosecond laser and ultrafast detection technology[D]. Nanjing:Jiangsu University, 2005. (in Chinese)刘立鹏. 飞秒激光双光子三维微细加工和超快检测技术的研究[D]. 南京:江苏大学, 2005.
[12]	Wang Zhijiang. Handbook of Practical Optical Technology[M]. Beijing:China Machine Press, 2007. (in Chinese)王之江. 实用光学技术手册[M].北京:机械工业出版社, 2007.
[13]	Cui Guihua. Design of plan field, apochromatic microscope objective and optical tolerances computation[D]. Beijing:Beijing Institute of Technology, 1987. (in Chinese)崔桂华. 平场复消色差显微物镜设计和光学公差计算[D]. 北京:北京理工大学, 1987.
[14]	Li Lin. Modern Optical Design[M]. Beijing:Beijing Institute of Technology Press, 2009. (in Chinese)李林. 现代光学设计方法[M]. 北京:北京理工大学出版社, 2009.
[15]	Zhang Yimo. Applied Optics[M]. Beijing:Publishing House of Electronics Industry, 2015. (in Chinese)张以谟. 应用光学[M]. 北京:电子工业出版社, 2015.
[16]	Yuan Xucang. Optical Design[M]. Beijing:Beijing Institute of Technology Press, 1988. (in Chinese)袁旭沧. 光学设计[M]. 北京:北京理工大学出版社, 1988.
[17]	Li Shixian, Li Lin. Handbook of Optical Design[M]. Beijing:Beijing Institute of Technology Press, 1996. (in Chinese)李士贤, 李林. 光学设计手册[M].北京:北京理工大学出版社, 1996.
[18]	International standard ISO 19012-1-2013, Microscopes-Designation of microscope objectives[S]. 2013.
[19]	Xu Weicai. Optical design and imaging performance compensation for the lithographic lens[D]. Changchun:Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2011. (in Chinese)许伟才. 投影光刻物镜的光学设计与像质补偿[D]. 长春:中国科学院长春光学精密机械与物理研究所, 2011.
[20]	Fu Yuanying, Li Yanqiu, Liu Xiaolin, et al. A method of tolerance analysis for wavefront error of lithographic projection lens[J]. Optical Technique, 2014, 40(4):289-294. (in Chinese)符媛英, 李艳秋, 刘晓林, 等. 投影光刻物镜波像差的公差分析方法[J]. 光学技术, 2014, 40(4):289-294.
[21]	Guo Xiarui, Wang Chunyu, Liao Zhibo, et al. Misalignment and assemblage stress analysis in space transmission optical system[J]. Infrared and Laser Engineering, 2012, 41(4), 947-951. (in Chinese)郭夏锐,王春雨, 廖志波, 等. 高精度透射式空间光学系统装调误差分析与动态控制[J]. 红外与激光工程, 2012, 41(4):947-951.
[22]	Li Mengjuan, Liao Zhibo, Wang Chunyu. Analysis and control on assemblage tolerance in small-aperture high-precision refractive optical system[J]. Journal of Applied Optics, 2015, 36(2):277-281. (in Chinese)栗孟娟, 廖志波, 王春雨. 小口径高精度折射式光学系统装调公差的分析与控制[J]. 应用光学, 2015, 36(2):277-281.

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通讯作者: 陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

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Design of high NA flat-field microscope objective for near infrared

1. Key Laboratory of Photoelectronic Imaging Technology and System,Ministry of Education of China,School of Optoelectronics,Beijing Institute of Technology,Beijing 100081,China

Received Date: 2016-11-05

Rev Recd Date: 2016-12-03

Publish Date: 2017-07-25

Key words:

Abstract: To meet the requirements of femtosecond laser micro-nanofabrication systems for high precision and wide region, the features and design specifications of infinity microscope objectives which were important components of the systems were determined. Based on the theory of primary aberration of thin lens system, the conditions to meet were concluded to correct Petzval curvature and second order spectrum for femtosecond wavelength. The objective consisted of 11 spherical lens, and all materials were glass made in China, and the use of cemented lens composed of three lens was avoided. A near infrared flat-field microscope objective, whose working wavelength was 785-815 nm, numerical aperture was 0.9, field of view in image space was 22.5 mm, magnification was 40, was designed. Designing results show that the objective has excellent MTF, RMS wavefront errors of all fields are less than 0.08, and various geometrical aberrations are deeply under tolerances, the results meet the conditions of flat field and apochromatism, and energy concentration is high. Compensators are used to slacken material tolerance, manufacturing tolerances and alignment tolerances. RMS wavefront errors of all fields get less than 0.09 after tolerances attribution and the objective can be applied actually.

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Reference (22)

[1]	Kawata S, Sun H B, Tanaka T, et al. Finer features for functional microdevices-micromachines can be created with higher resolution using two-photon absorption[J]. Nature,2001, 412(6848):697-698.
[2]	Dong Xianzi, Chen Weiqiang, Zhao Zhensheng, et al. Femtosecond pulse laser two-photon micro-nanofabrication technology and application[J]. Chinese Science Bulletin, 2008, 53(1):2-13. (in Chinese)董贤子, 陈卫强, 赵振声, 等. 飞秒脉冲激光双光子微纳加工技术及其应用[J]. 科学通报, 2008, 53(1):2-13.
[3]	Li Yan. The research of femtosecond laser micro-nanofabrication[D]. Changchun:Jilin University, 2010. (in Chinese)李岩. 飞秒激光微纳加工制备研究[D].长春:吉林大学, 2010.
[4]	Kuang Yuguang. Lens design of the flat field, apochromatic CF microscopic objective[J]. Acta Optica Sinica, 1994, 14(5):558-560. (in Chinese)匡裕光. 平象场复消色差大视场显微物镜光学设计[J]. 光学学报, 1994, 14(5):558-560.
[5]	Chen Jiao, Jiao Mingyin, Chang Weijun, et al. Optical design of apochromatic microscope objective for near ultraviolet-visible wide spectrum[J]. Journal of Applied Optics, 2011, 32(6):1098-1102. (in Chinese)陈姣, 焦明印, 常伟军, 等. 近紫外-可见光宽波段复消色差显微物镜设计[J]. 应用光学, 2011, 32(6):1098-1102.
[6]	Xue Jinlai, Gong Yan, Li Dianmeng. Optical design of the N.A. 0.75 plan-apochromatic microscope objective[J]. Chinese Optics, 2015, 8(6):957-963. (in Chinese)薛金来, 巩岩, 李佃蒙. N.A. 0.75平场复消色差显微物镜光学设计[J]. 中国光学, 2015, 8(6):957-963.
[7]	Miks A, Novak J. Method for primary design of superachromats[J]. Applied Optics, 2013, 52(28):6668-6876.
[8]	Liu Qian, Yang Weichuan, Yuan Daocheng, et al. Design of linear dispersive objective for chromatic confocal microscope[J]. Opt Precision Eng, 2013, 21(10):2473-2479. (in Chinese)刘乾, 杨维川, 袁道成, 等. 光谱共焦显微镜的线性色散物镜设计[J]. 光学精密工程, 2013, 21(10):2473-2479.
[9]	Meng Qingyu, Dong Jihong, Wang Dong, et al. Minitype optical system development of stereo camera[J]. Infrared and Laser Engineering, 2016, 45(4):0418002. (in Chinese)孟庆宇, 董吉洪, 王栋, 等.轻小型立体相机光学系统研制[J]. 红外与激光工程, 2016, 45(4):0418002.
[10]	Li Lin. Applied Optics[M]. Beijing:Beijing Institute of Technology Press, 2010. (in Chinese)李林. 应用光学[M]. 北京:北京理工大学出版社, 2010.
[11]	Liu Lipeng. The research of 3D micro-fabrication with two-photon absorption of femtosecond laser and ultrafast detection technology[D]. Nanjing:Jiangsu University, 2005. (in Chinese)刘立鹏. 飞秒激光双光子三维微细加工和超快检测技术的研究[D]. 南京:江苏大学, 2005.
[12]	Wang Zhijiang. Handbook of Practical Optical Technology[M]. Beijing:China Machine Press, 2007. (in Chinese)王之江. 实用光学技术手册[M].北京:机械工业出版社, 2007.
[13]	Cui Guihua. Design of plan field, apochromatic microscope objective and optical tolerances computation[D]. Beijing:Beijing Institute of Technology, 1987. (in Chinese)崔桂华. 平场复消色差显微物镜设计和光学公差计算[D]. 北京:北京理工大学, 1987.
[14]	Li Lin. Modern Optical Design[M]. Beijing:Beijing Institute of Technology Press, 2009. (in Chinese)李林. 现代光学设计方法[M]. 北京:北京理工大学出版社, 2009.
[15]	Zhang Yimo. Applied Optics[M]. Beijing:Publishing House of Electronics Industry, 2015. (in Chinese)张以谟. 应用光学[M]. 北京:电子工业出版社, 2015.
[16]	Yuan Xucang. Optical Design[M]. Beijing:Beijing Institute of Technology Press, 1988. (in Chinese)袁旭沧. 光学设计[M]. 北京:北京理工大学出版社, 1988.
[17]	Li Shixian, Li Lin. Handbook of Optical Design[M]. Beijing:Beijing Institute of Technology Press, 1996. (in Chinese)李士贤, 李林. 光学设计手册[M].北京:北京理工大学出版社, 1996.
[18]	International standard ISO 19012-1-2013, Microscopes-Designation of microscope objectives[S]. 2013.
[19]	Xu Weicai. Optical design and imaging performance compensation for the lithographic lens[D]. Changchun:Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2011. (in Chinese)许伟才. 投影光刻物镜的光学设计与像质补偿[D]. 长春:中国科学院长春光学精密机械与物理研究所, 2011.
[20]	Fu Yuanying, Li Yanqiu, Liu Xiaolin, et al. A method of tolerance analysis for wavefront error of lithographic projection lens[J]. Optical Technique, 2014, 40(4):289-294. (in Chinese)符媛英, 李艳秋, 刘晓林, 等. 投影光刻物镜波像差的公差分析方法[J]. 光学技术, 2014, 40(4):289-294.
[21]	Guo Xiarui, Wang Chunyu, Liao Zhibo, et al. Misalignment and assemblage stress analysis in space transmission optical system[J]. Infrared and Laser Engineering, 2012, 41(4), 947-951. (in Chinese)郭夏锐,王春雨, 廖志波, 等. 高精度透射式空间光学系统装调误差分析与动态控制[J]. 红外与激光工程, 2012, 41(4):947-951.
[22]	Li Mengjuan, Liao Zhibo, Wang Chunyu. Analysis and control on assemblage tolerance in small-aperture high-precision refractive optical system[J]. Journal of Applied Optics, 2015, 36(2):277-281. (in Chinese)栗孟娟, 廖志波, 王春雨. 小口径高精度折射式光学系统装调公差的分析与控制[J]. 应用光学, 2015, 36(2):277-281.

Design of high NA flat-field microscope objective for near infrared

doi: 10.3788/IRLA201746.0718006

Abstract

References

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通讯作者: 陈斌, bchen63@163.com

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