Volume 46 Issue 12
Jan.  2018
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Chen Gang, Li Mo, Lv Yanqiu, Zhu Xubo, Cao Xiancun. Temperature effect of InAlSb infrared detectors on photoelectric properties by molecular beam epitaxy[J]. Infrared and Laser Engineering, 2017, 46(12): 1204003-1204003(5). doi: 10.3788/IRLA201746.1204003
Citation: Chen Gang, Li Mo, Lv Yanqiu, Zhu Xubo, Cao Xiancun. Temperature effect of InAlSb infrared detectors on photoelectric properties by molecular beam epitaxy[J]. Infrared and Laser Engineering, 2017, 46(12): 1204003-1204003(5). doi: 10.3788/IRLA201746.1204003

Temperature effect of InAlSb infrared detectors on photoelectric properties by molecular beam epitaxy

doi: 10.3788/IRLA201746.1204003
  • Received Date: 2017-04-05
  • Rev Recd Date: 2017-05-03
  • Publish Date: 2017-12-25
  • The In1-xAlxSb epitaxial layers of p+-p+-n-n+ barrier structure were grown on the InSb(100) substrate by molecular beam epitaxy. The crystal quality and Al composition of the material were measured and characterized by X-ray diffraction. The full width at half maximum of the InAlSb epitaxial layer was 0.05, indicating good performance monocrystalline epitaxial material. The Al content of 2.5% was calculated according to Bragg's formula and Vegard's law. When the InAlSb material was fabricated as an infrared detector diode and the spectral response curve was measured at 77 K to 210 K, it was found that the cutoff wavelength of the detector increased from 4.48 m at 77 K to 4.95 m at 210 K. By fitting the Varshni relation of In0.975Al0.025Sb with the experimental data of bandgap, the values of Eg(0), and are 0.238 6 eV, 2.8710-4 eV/K and 166.9 K, respectively. After the I-V test, the dark current density reached as low as 1.0910-5 A/cm-2 and the resistance area product is 1.40104 cm2 at 110 K, -0.1 V bias, which is equivalent to the performance of InSb detector at 77 K. Besides, the influence of the temperature on different types of dark current was analyzed, and the transition temperature between the diffusion current and G-R current was 120 K.
  • [1] Ashley T, Burke T M, Emeny M T, et al. Epitaxial InSb for elevated temperature operation of large IR focal plane arrays[C]//SPIE, 2003, 5074:95-102.
    [2] Haigh M K, Nash G R, Smith S J, et al. Mid-infrared AlxIn1-xSb light-emitting diodes[J]. Appl Phys Lett, 2007, 90:231116.
    [3] Yao G S, Zhang L X, Zhang X F, et al. Mesa etching process for InAs/GaSb SLs grown by MBE[J]. Infrared and Laser Engineering, 2015, 44(3):951-954.
    [4] Klipstein P, Calahorra Z, Zemel A, et al. 3rd generation infrared detector program at SCD[C]//SPIE, 2006, 5406:222-229.
    [5] Evirgen A, Abautret J, Perez J P, et al. Midwave infrared InSb nBn photodetector[J]. Electronics Letters, 2014, 50:1472-1473.
    [6] Perez J P, Evirgen A, Abautret J, et al. MWIR InSb detector with nBn architecture for high operating temperature[C]//SPIE, 2015, 9370:93700N.
    [7] Dai N, Brown F, Doezema R E, et al. Determination of the concentration and temperature dependence of the fundamental energy gap in AlxIn1-xSb[J]. Applied Physics Letters, 1998, 73:3132-3134.
    [8] Isomura S, Prat F G D, Woolley J C. Electroreflectance spectra of AlxIn1-xSb alloys[J]. Physics Status Solidi A, 1974, 65:213-219.
    [9] Komkov O S, Semenov A N, Firsov D D, et al. Optical properties of epitaxial AlxIn1-xSb alloy layers[J]. Semiconductors, 2011, 45:1425-1429.
    [10] Klin O, Klipstein P C, Jacobsohn E, et al. Molecular beam epitaxy grown In1-xAlxSb/InSb structures for infrared detectors[J]. Journal of Vacuum Science and Technology, 2006, B24(3):1607-1612.
    [11] Varshni Y P. Temperature dependence of the energy gap in semiconductors[J]. Physics, 1967, 34:149-154.
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Temperature effect of InAlSb infrared detectors on photoelectric properties by molecular beam epitaxy

doi: 10.3788/IRLA201746.1204003
  • 1. China Airborne Missile Academy,Luoyang 471009,China;
  • 2. Aviation Key Laboratory of Science and Technology on Infrared Detector,Luoyang 471009,China

Abstract: The In1-xAlxSb epitaxial layers of p+-p+-n-n+ barrier structure were grown on the InSb(100) substrate by molecular beam epitaxy. The crystal quality and Al composition of the material were measured and characterized by X-ray diffraction. The full width at half maximum of the InAlSb epitaxial layer was 0.05, indicating good performance monocrystalline epitaxial material. The Al content of 2.5% was calculated according to Bragg's formula and Vegard's law. When the InAlSb material was fabricated as an infrared detector diode and the spectral response curve was measured at 77 K to 210 K, it was found that the cutoff wavelength of the detector increased from 4.48 m at 77 K to 4.95 m at 210 K. By fitting the Varshni relation of In0.975Al0.025Sb with the experimental data of bandgap, the values of Eg(0), and are 0.238 6 eV, 2.8710-4 eV/K and 166.9 K, respectively. After the I-V test, the dark current density reached as low as 1.0910-5 A/cm-2 and the resistance area product is 1.40104 cm2 at 110 K, -0.1 V bias, which is equivalent to the performance of InSb detector at 77 K. Besides, the influence of the temperature on different types of dark current was analyzed, and the transition temperature between the diffusion current and G-R current was 120 K.

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