Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

Mao Shanshan; Li Yanqiu; Liu Ke; Liu Lihui; Zheng Meng; Yan Xu

doi:10.3788/IRLA201948.0814002

Volume 48 Issue 8

Aug. 2019

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Mao Shanshan, Li Yanqiu, Liu Ke, Liu Lihui, Zheng Meng, Yan Xu. Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces[J]. Infrared and Laser Engineering, 2019, 48(8): 814002-0814002(7). doi: 10.3788/IRLA201948.0814002

Citation:

Mao Shanshan, Li Yanqiu, Liu Ke, Liu Lihui, Zheng Meng, Yan Xu. Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces[J]. Infrared and Laser Engineering, 2019, 48(8): 814002-0814002(7). doi: 10.3788/IRLA201948.0814002

Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

doi: 10.3788/IRLA201948.0814002

1.
Key Laboratory of Photoelectronic Imaging Technology and System,Ministry of Education,School of Optics and Photonics,Beijing Institute of Technology,Beijing 100081,China

Received Date: 2019-03-05
Rev Recd Date: 2019-04-03
Publish Date: 2019-08-25

Abstract

High numerical aperture(NA) projection objectives with freeform surfaces are demanded for extreme ultraviolet lithography(EUVL) with high resolution. The traditional aspherical EUVL lens design is difficult to meet the need of correcting aberrations under a large NA, which often causes obscuration and destroys the imaging contrast. A design method of a high NA EUVL objective with freeform surfaces and without obscurations was proposed. Lens-form parameters were used to determine the best position to insert freeform surface, which could effectively correct aberrations and increase NA of the system without affecting the imaging performance. A set of high NA EUVL projection objective(PO) with freeform surfaces was designed by this method. Compared with the initial aspherical objective, by adding four freeform surfaces, the objective NA was increased from 0.3 to 0.35 and wavefront error RMS was reduced from 1 nm to 0.6 nm, and there was no obscuration in the entire optical path. The design results indicate that the proposed method effectively improves the design efficiency of the freeform surfaces EUVL objective. In the case of no obscuration, the system not only increases the NA, but also reduces the wavefront error, which greatly improves the overall performance of the objective.
- lens system design,
- geometric optical design,
- freeform surface,
- extreme ultraviolet

References

[1]	Hans Meiling, Henk Meijer, Vadim Banine, et al. First performance results of the ASML alpha demo tool[C]//SPIE, 2006, 6151:615108.
[2]	Liu Fei, Li Yanqiu. Initial structure design of coaxial six-ten mirror central-obscured extreme ultraviolet lithographic objective[J]. Applied Optics, 2014, 53(28):6444-6451.
[3]	Jin Chunshui. Investigation on extreme ultraviolet lithography[D]. Changchun:Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2002. (in Chinese)
[4]	Ni Mingyang, Gong Yan. Design and analysis of kinematic lens positioning structure in lithographic projection objective[J]. Chinese Optics, 2012, 5(5):476-484. (in Chinese)
[5]	Liu Fei, Li Yanqiu. Design of high numerical aperture projection objective for industrial extreme ultraviolet lithography[J]. Acta Optica Sinica, 2011, 31(2):0222003. (in Chinese)
[6]	Cao Zhen, Li Yanqiu, Liu Fei. Manufacturable design of 16-22 nm extreme ultraviolet lithographic objective[J]. Acta Optica Sinica, 2013, 33(9):0922005. (in Chinese)
[7]	Liu Yan, Li Yanqiu, Cao Zhen. Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process[J]. Optical Engineering, 2015, 54(7):075102.
[8]	Liu Yan, Li Yanqiu, Cao Zhen. Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method[J]. Applied Optics, 2016, 55(18):4917-4923.
[9]	Liu Jun, Huang Wei. Optical system design of reflective head mounted display using freeform surfaces[J]. Infrared and Laser Engineering, 2016, 45(10):1018001. (in Chinese)
[10]	Wang Hong, Wang Lijun, Ye Feifei, et al. Design of LED headlight low-beam freeform lens based on projector system[J]. Infrared and Laser Engineering, 2012, 41(9):2463-2467. (in Chinese)
[11]	Xu Mingfei, Pang Wubin, Xu Xiangru, et al. Optical design of high-numerical aperture lithographic lenses[J]. Optics and Precision Engineering, 2016, 24(4):740-746. (in Chinese)
[12]	Wang Yongtian, Cheng Dewen, Xu Chen. The optical display technology of virtual reality[J]. Science China, 2016, 46(12):1694-1710. (in Chinese)
[13]	Cheng Dewen, Wang Yongtian, Xu Chen, et al. Design of an ultra-thin near-eye display with geometrical waveguide and freeform optics[J]. Optics Express, 2014, 22(17):20705.
[14]	Jose M Sasian, Michael R Descour. Power distribution and symmetry in lens systems[J]. Optical Engineering, 1998, 37(3):1001-1004.
[15]	Cheng Xuemin, Wang Yongtian, Hao Qun, et al. Automatic element addition and deletion in lens optimization[J]. Applied Optics, 2003, 42(7):1309-1317.
[16]	Liu Fei, Li Yanqiu. Design of multi-mirror optics for industrial extreme ultraviolet lithography[J]. Optical Review, 2013, 20(2):120-126.
[17]	Fabian Duerr, Youri Meuret, Hugo Thienpont. Potential benefits of free-form optics in on-axis imaging applications with high aspect ratio[J]. Optics Express, 2013, 21(25):31072-31081.
[18]	Cheng Dewen, Wang Yongtian, Hua Hong, et al. Design of an optical see-through head-mounted display with a low f-number and large field of view using a freeform prism[J]. Applied Optics, 2009, 48(14):2655-2668.
[19]	Li Rongbin, Zhang Zhihui, Du Xue, et al. Ultra-precision machining technology of freeform optics and its applications[J]. Infrared and Laser Engineering, 2010, 39(1):110-115. (in Chinese)
[20]	Shen Hua. Research on key techniques of tilted-wave-interferometer used in the measurement of freeform surfaces[D]. Nanjing:Nanjing University of Science Technology, 2014. (in Chinese)
[21]	Xu Xiangru. Research on imaging quality compensation and polarization aberration of hyper numerical aperture lithographic lens[D]. Changchun:Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2017. (in Chinese)

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通讯作者: 陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

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Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

1. Key Laboratory of Photoelectronic Imaging Technology and System,Ministry of Education,School of Optics and Photonics,Beijing Institute of Technology,Beijing 100081,China

Received Date: 2019-03-05

Rev Recd Date: 2019-04-03

Publish Date: 2019-08-25

Key words:

Abstract: High numerical aperture(NA) projection objectives with freeform surfaces are demanded for extreme ultraviolet lithography(EUVL) with high resolution. The traditional aspherical EUVL lens design is difficult to meet the need of correcting aberrations under a large NA, which often causes obscuration and destroys the imaging contrast. A design method of a high NA EUVL objective with freeform surfaces and without obscurations was proposed. Lens-form parameters were used to determine the best position to insert freeform surface, which could effectively correct aberrations and increase NA of the system without affecting the imaging performance. A set of high NA EUVL projection objective(PO) with freeform surfaces was designed by this method. Compared with the initial aspherical objective, by adding four freeform surfaces, the objective NA was increased from 0.3 to 0.35 and wavefront error RMS was reduced from 1 nm to 0.6 nm, and there was no obscuration in the entire optical path. The design results indicate that the proposed method effectively improves the design efficiency of the freeform surfaces EUVL objective. In the case of no obscuration, the system not only increases the NA, but also reduces the wavefront error, which greatly improves the overall performance of the objective.

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Reference (21)

[1]	Hans Meiling, Henk Meijer, Vadim Banine, et al. First performance results of the ASML alpha demo tool[C]//SPIE, 2006, 6151:615108.
[2]	Liu Fei, Li Yanqiu. Initial structure design of coaxial six-ten mirror central-obscured extreme ultraviolet lithographic objective[J]. Applied Optics, 2014, 53(28):6444-6451.
[3]	Jin Chunshui. Investigation on extreme ultraviolet lithography[D]. Changchun:Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2002. (in Chinese)
[4]	Ni Mingyang, Gong Yan. Design and analysis of kinematic lens positioning structure in lithographic projection objective[J]. Chinese Optics, 2012, 5(5):476-484. (in Chinese)
[5]	Liu Fei, Li Yanqiu. Design of high numerical aperture projection objective for industrial extreme ultraviolet lithography[J]. Acta Optica Sinica, 2011, 31(2):0222003. (in Chinese)
[6]	Cao Zhen, Li Yanqiu, Liu Fei. Manufacturable design of 16-22 nm extreme ultraviolet lithographic objective[J]. Acta Optica Sinica, 2013, 33(9):0922005. (in Chinese)
[7]	Liu Yan, Li Yanqiu, Cao Zhen. Design method of off-axis extreme ultraviolet lithographic objective system with a direct tilt process[J]. Optical Engineering, 2015, 54(7):075102.
[8]	Liu Yan, Li Yanqiu, Cao Zhen. Design of anamorphic magnification high-numerical aperture objective for extreme ultraviolet lithography by curvatures combination method[J]. Applied Optics, 2016, 55(18):4917-4923.
[9]	Liu Jun, Huang Wei. Optical system design of reflective head mounted display using freeform surfaces[J]. Infrared and Laser Engineering, 2016, 45(10):1018001. (in Chinese)
[10]	Wang Hong, Wang Lijun, Ye Feifei, et al. Design of LED headlight low-beam freeform lens based on projector system[J]. Infrared and Laser Engineering, 2012, 41(9):2463-2467. (in Chinese)
[11]	Xu Mingfei, Pang Wubin, Xu Xiangru, et al. Optical design of high-numerical aperture lithographic lenses[J]. Optics and Precision Engineering, 2016, 24(4):740-746. (in Chinese)
[12]	Wang Yongtian, Cheng Dewen, Xu Chen. The optical display technology of virtual reality[J]. Science China, 2016, 46(12):1694-1710. (in Chinese)
[13]	Cheng Dewen, Wang Yongtian, Xu Chen, et al. Design of an ultra-thin near-eye display with geometrical waveguide and freeform optics[J]. Optics Express, 2014, 22(17):20705.
[14]	Jose M Sasian, Michael R Descour. Power distribution and symmetry in lens systems[J]. Optical Engineering, 1998, 37(3):1001-1004.
[15]	Cheng Xuemin, Wang Yongtian, Hao Qun, et al. Automatic element addition and deletion in lens optimization[J]. Applied Optics, 2003, 42(7):1309-1317.
[16]	Liu Fei, Li Yanqiu. Design of multi-mirror optics for industrial extreme ultraviolet lithography[J]. Optical Review, 2013, 20(2):120-126.
[17]	Fabian Duerr, Youri Meuret, Hugo Thienpont. Potential benefits of free-form optics in on-axis imaging applications with high aspect ratio[J]. Optics Express, 2013, 21(25):31072-31081.
[18]	Cheng Dewen, Wang Yongtian, Hua Hong, et al. Design of an optical see-through head-mounted display with a low f-number and large field of view using a freeform prism[J]. Applied Optics, 2009, 48(14):2655-2668.
[19]	Li Rongbin, Zhang Zhihui, Du Xue, et al. Ultra-precision machining technology of freeform optics and its applications[J]. Infrared and Laser Engineering, 2010, 39(1):110-115. (in Chinese)
[20]	Shen Hua. Research on key techniques of tilted-wave-interferometer used in the measurement of freeform surfaces[D]. Nanjing:Nanjing University of Science Technology, 2014. (in Chinese)
[21]	Xu Xiangru. Research on imaging quality compensation and polarization aberration of hyper numerical aperture lithographic lens[D]. Changchun:Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2017. (in Chinese)

Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

doi: 10.3788/IRLA201948.0814002

Abstract

References

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