Volume 48 Issue 9
Oct.  2019
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Li Meixuan, Li Hong, Zhang Siqi, Zhang Wenying, Guo Ming. Design of diffractive optical element based on discrete sampling encryption algorithm[J]. Infrared and Laser Engineering, 2019, 48(9): 916004-0916004(9). doi: 10.3788/IRLA201948.0916004
Citation: Li Meixuan, Li Hong, Zhang Siqi, Zhang Wenying, Guo Ming. Design of diffractive optical element based on discrete sampling encryption algorithm[J]. Infrared and Laser Engineering, 2019, 48(9): 916004-0916004(9). doi: 10.3788/IRLA201948.0916004

Design of diffractive optical element based on discrete sampling encryption algorithm

doi: 10.3788/IRLA201948.0916004
  • Received Date: 2019-04-05
  • Rev Recd Date: 2019-05-10
  • Publish Date: 2019-09-25
  • In order to meet the high uniformity and different illumination mode requirement of the mask plane of the immersion lithography illumination system, the illumination mode converter system was studied. Diffractive Optical Elements (DOE) were used to generate various illumination modes, started from grating structure, the process of converting the grating into DOE by two-step transformation was analyzed. And a discrete sampling encryption algorithm was proposed. By examples of quadrupole illumination DOE with sampling width 1-5 m, the correspondence relationship between the DOE feature size, diffraction efficiency and the intensity distribution non-uniformity was disclosed. The design results show that as the sampling line width decreases, the diffraction efficiency and uniformity of the shaped beam will be greatly improved. The 16-step illumination mode conversion DOE with feature size of 1.76m1.76m was fabricated by contact lithography.The optical non-uniformity and diffraction efficiency of DOE under different illumination modes were tested by setting up an optical test platform. The results meet the design requirements and verify that the discrete sampling encryption algorithm can effectively guide the design of the DOE for the illumination mode transformation system.
  • [1] Hu Zhonghua, Zhu Jing, Yang Baoxi, et al. Far-field multi-parameter measurement of diffractive optical element for pupilshaping in lithography system[J]. Chinese Journal of Lasers, 2013, 40(9):0908001. (in Chinese)胡中华, 朱菁, 杨宝喜, 等. 光刻机光瞳整形衍射光学元件远场多参数检测方法[J]. 中国激光, 2013, 40(9):0908001.
    [2] Dorodnyy A, Shklover V, Braginsky L, et al. High-efficiency spectrum splitting for solar photovoltaic[J]. Solar Energy Materials Solar Cells, 2015, 136(10):120-126.
    [3] Zhang L, Liu D, Shi T, et al. Practical and accurate method for aspheric misalignment aberrations calibration in non-null interferometer testing[J]. Applied Optics, 2013, 52(35):8501-8511.
    [4] Zhang Wei, Gong Yan. Design of diffractive optical elements for off-axis illumination in projection lithography[J]. Opt Precision Eng, 2008, 16(11):2081-2086. (in Chinese)张巍, 巩岩. 投影光刻离轴照明用衍射光学元件设计[J]. 光学精密工程, 2008, 16(11):2081-2086.
    [5] Song Qiang, Zhu Jing, Wang Jian. A mixed gradient algorithm for high performance DOE design in off axis lithography illumination system[J]. Acta Optica Sinica, 2015, 35(1):0122005. (in Chinese)宋强, 朱菁, 王健. 基于混合梯度下降的高性能光刻机离轴照明衍射光学元件设计[J]. 光学学报, 2015, 35(1):0122005.
    [6] Zhang Wei, Liang Chuanyang, Li Jin, et al. Design of optical elements for beam shaping and unigorm illumination in laser digital projection display system[J]. Acta Optica Sinica, 2015, 35(1):0805001. (in Chinese)张巍, 梁传样, 李金, 等. 用于激光数字投影显示系统的匀光整形元件设计[J].光学学报, 2015, 35(1):0805001.
    [7] Li Meixuan, Dong Lianhe. Light mode converter design in immersion lithography lighting system[J]. Infrared and Laser Engineering, 2018, 47(6):0618002. (in Chinese)李美萱, 董连和. 浸没式光刻照明系统的照明模式变换器[J]. 红外与激光工程, 2018, 47(6):0618002.
    [8] Bao Haiting, Ouyang Mingzhao, Wang Zhiyong, et al. Design of light field shaping system based on DOE identification[J]. Journal of Changchun University of Science and Technology, 2017, 40(2):27-32. (in Chinese)包海廷, 欧阳名钊, 王志勇, 等. 基于DOE的标识光场整形系统设计[J]. 长春理工大学学报, 2017, 40(2):27-32.
    [9] Uzu H, Ichikawa M, Hino M, et al. High efficiency solar cells combining a perovskite and a silicon heterojunction solar cells visa an optical splitting system[J]. Appl Phys Lett, 2015, 106(1):013506-013510.
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Design of diffractive optical element based on discrete sampling encryption algorithm

doi: 10.3788/IRLA201948.0916004
  • 1. Institute For Interdisciplinary Quantum Information Technology,Jilin Engineering Normal University,Changchun 130052,China;
  • 2. Jilin Engineering Laboratory for Quantum Information Technology,Changchun 130052,China

Abstract: In order to meet the high uniformity and different illumination mode requirement of the mask plane of the immersion lithography illumination system, the illumination mode converter system was studied. Diffractive Optical Elements (DOE) were used to generate various illumination modes, started from grating structure, the process of converting the grating into DOE by two-step transformation was analyzed. And a discrete sampling encryption algorithm was proposed. By examples of quadrupole illumination DOE with sampling width 1-5 m, the correspondence relationship between the DOE feature size, diffraction efficiency and the intensity distribution non-uniformity was disclosed. The design results show that as the sampling line width decreases, the diffraction efficiency and uniformity of the shaped beam will be greatly improved. The 16-step illumination mode conversion DOE with feature size of 1.76m1.76m was fabricated by contact lithography.The optical non-uniformity and diffraction efficiency of DOE under different illumination modes were tested by setting up an optical test platform. The results meet the design requirements and verify that the discrete sampling encryption algorithm can effectively guide the design of the DOE for the illumination mode transformation system.

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