Depositing chromium nano lines by atom lithography

Wang Jianbo; Deng Xiao; Zhang Pingping; Ma Yan; Yin Cong; Qian Jin; Li Tongbao

Chromium nanometer grating can be repetitively fabricated by atom lithography, this nanometer grating can be used as a nano pitch standard to realize the calibration of high precise measurement equipments, such as scanning probe microscopy, scanning electronic microscopy. In the high vacuum apparatus, chromium atoms evaporated from a high temperature effusion cell, and the propagating atoms interacted with the cooling light and standing light wave respectively, so they were collimated, focused and deposited on the InP substrate which located behind of the standing light wave. During 3h depositing, a nanometer grating with space distance of 212.78 nm, corresponding to the laser wave length, and height of 9 nm was obtained. Considering the low growing speed of nanometer lines, the possible reasons were analyzed and the solutions would be applied in the following experiments.

1. School of Physics Science and Engineering,Tongji University,Shanghai 200092,China;

2. National Institute of Metrology,Beijing 100013,China

Received Date: 2013-09-11

Rev Recd Date: 2013-10-23

Publish Date: 2014-05-25

Key words:

Abstract: Chromium nanometer grating can be repetitively fabricated by atom lithography, this nanometer grating can be used as a nano pitch standard to realize the calibration of high precise measurement equipments, such as scanning probe microscopy, scanning electronic microscopy. In the high vacuum apparatus, chromium atoms evaporated from a high temperature effusion cell, and the propagating atoms interacted with the cooling light and standing light wave respectively, so they were collimated, focused and deposited on the InP substrate which located behind of the standing light wave. During 3h depositing, a nanometer grating with space distance of 212.78 nm, corresponding to the laser wave length, and height of 9 nm was obtained. Considering the low growing speed of nanometer lines, the possible reasons were analyzed and the solutions would be applied in the following experiments.

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Reference (35)

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Depositing chromium nano lines by atom lithography

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