Volume 43 Issue 12
Jan.  2015
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Fu Xiuhua, Yang Jinye, Liu Dongmei, Zhang Jing, Kou Yang. Design and preparation of anti-reflection and protective film in 8-11 μm infrared detection system[J]. Infrared and Laser Engineering, 2014, 43(12): 3889-3893.
Citation: Fu Xiuhua, Yang Jinye, Liu Dongmei, Zhang Jing, Kou Yang. Design and preparation of anti-reflection and protective film in 8-11 μm infrared detection system[J]. Infrared and Laser Engineering, 2014, 43(12): 3889-3893.

Design and preparation of anti-reflection and protective film in 8-11 μm infrared detection system

  • Received Date: 2014-04-13
  • Rev Recd Date: 2014-05-19
  • Publish Date: 2014-12-25
  • With the rapid development of modern military space technology, the requirement of infrared detector is increasing, the requirement of infrared optical element will stricter at the same time. The preparation of anti-reflection and protective film on the substrate of ZnS were mainly studied. The coating method of dielectric and hard film were combined, through the comparative analysis of different materials, finally, the carbide germanium (Ge1-xCx) as transition layer which between media film and DLC would be selectted. Using electron beam and ion source assisted deposition technology to manufacture the dielectric film, and using magnetron sputtering technology to manufacture the transition layer, at the end of process the DLC will be prepared by chemical vapor deposition technique. The problems of stress matching, and integrate different sedimentary processes were solved, meanwhile a stable process preparation process was got. Finally, the anti-reflection and protective film were deposited which average transmitted is 92%, the hardness meets the requirements.
  • [1]
    [2] Yu Donghai, Wang Chengyong, Cheng Xiaoling, et al. Rccent development of magnetron sputtering processes[J]. Vacuum,2009, 46(2): 19-25. (in Chinese) 余东海, 王成勇, 成晓玲, 等. 磁控溅射镀膜技术的发展[J]. 真空, 2009, 46(2): 19-25.
    [3]
    [4] Fu Xiuhua, Jiang Huilin, Fu Xinhua, et al. Study on multi-waveband infrared antireflection and protection film [ J] . Acta ArmamentarII, 2007, 28(10): 1183-1185. (in Chinese) 付秀华, 姜会林, 付新华, 等. 多波段红外增透与保护膜技 术的研究[J]. 兵工学报, 2007, 28(10): 1183-1185.
    [5]
    [6] Tang Jinfa, Gu Peifu, Liu Xu, et al. Modern Optical Thin Film Technology [M]. Hangzhou: Zhejiang University Press, 2006: 239-242. (in Chinese) 唐晋发, 顾培夫, 刘旭, 等. 现代光学薄膜技术[M]. 杭州: 浙江大学出版社, 2006: 239-242.
    [7]
    [8] Li Zhengzhong. Optical Thin Film and Coating Technology[M]. Taipei: Yixuan Book Publishing, 2004: 373-374. (in Chinese) 李正中. 薄膜光学与镀膜技术[M]. 台北: 艺轩图书出版 社, 2004: 373-374.
    [9] Macleod H A. Thin-film Optical Filters [M]. 3rd ed. Philadelphia: Institute of Physic, Publishing, 2001.
    [10]
    [11]
    [12] Fu Xiuhua, Wang Gang, Liu Dongmei, et al. Visible and infrared guidance system development of high pass filter [J]. Chinese Journal of Lasers, 2013, 40 (1): 10107001-1010700. (in Chinese) 付秀华, 王刚, 刘冬梅, 等. 可见与红外制导系统高通滤 光片的研制[J].中国激光, 2013, 40(1): 10107001-10107006.
    [13]
    [14] Zhang C H, Wang Y T, Lu W Q. Single-wavelength monitoring method for optical thin-film coating[J]. Opt Eng, 2004, 43(6): 1439-1444.
    [15] Wang Xiaoyi, Gao Jinsong, Chen Hong, et al. Increasing sp3 hybridized carbon atoms in germanium carbide films by increasing RF power and substrate temperature [J]. Infrared and Laser Engineering, 2012, 41(8): 2167-2172. (in Chinese) 王笑夷, 高劲松, 陈红, 等. 射频功率和衬底温度对碳化锗 膜中sp3 杂化碳原子的影响[J]. 红外与激光工程, 2012, 41(8): 2167-2172.
    [16]
    [17] Ji Yiqin, Liu Huasong, Zhang Yanmin. Test and analysis of optical film constants [J]. Infrared and Laser Engineering, 2006, 35(5): 513-518. (in Chinese) 季一勤, 刘华松, 张艳敏. 光学薄膜常数的测试与分析[J]. 红外与激光工程, 2006, 35(5): 513-518.
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Design and preparation of anti-reflection and protective film in 8-11 μm infrared detection system

  • 1. (College of Opto-Electronic Engineering,Changchun University of Science and Technology,Changchun 130022,China

Abstract: With the rapid development of modern military space technology, the requirement of infrared detector is increasing, the requirement of infrared optical element will stricter at the same time. The preparation of anti-reflection and protective film on the substrate of ZnS were mainly studied. The coating method of dielectric and hard film were combined, through the comparative analysis of different materials, finally, the carbide germanium (Ge1-xCx) as transition layer which between media film and DLC would be selectted. Using electron beam and ion source assisted deposition technology to manufacture the dielectric film, and using magnetron sputtering technology to manufacture the transition layer, at the end of process the DLC will be prepared by chemical vapor deposition technique. The problems of stress matching, and integrate different sedimentary processes were solved, meanwhile a stable process preparation process was got. Finally, the anti-reflection and protective film were deposited which average transmitted is 92%, the hardness meets the requirements.

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