Volume 42 Issue 8
Feb.  2014
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Xie Yao, Zhao Yongpeng, Wang Qi. Research of enhancing the output of capillary discharge-pumped Ne-like Ar 46.9 nm soft X-ray laser[J]. Infrared and Laser Engineering, 2013, 42(8): 2036-2040.
Citation: Xie Yao, Zhao Yongpeng, Wang Qi. Research of enhancing the output of capillary discharge-pumped Ne-like Ar 46.9 nm soft X-ray laser[J]. Infrared and Laser Engineering, 2013, 42(8): 2036-2040.

Research of enhancing the output of capillary discharge-pumped Ne-like Ar 46.9 nm soft X-ray laser

  • Received Date: 2012-12-17
  • Rev Recd Date: 2013-01-19
  • Publish Date: 2013-08-25
  • The observation of the capillary discharge-pumped Ne-like Ar 46.9 nm soft X-ray laser output was reported under the condition of pure Ar and gaseous mixture of Ar-He, Ar-Ne, Ar-N2 and Ar-Kr. Mixing Ar with an appropriate quantity of He, the laser output was enhanced evidently, and there was an optimum ratio of He in the gaseous mixture of Ar-He, which could be the best for laser output. The experimental results of Ar-Ne, Ar-N2 and Ar-Kr mixture show that Ne, N2 and Kr decrease the laser output. The source research of discharged produced plasma in extreme ultraviolet lithography also mixes an appropriate quantity of He, in order to enhance 13.5 nm.
  • [1] Gaeta C J, Rieger H, Turcu I C E, et al. High-power collimated laser-plasma source for proximity X-Ray nanolithography[J]. Journal of Vacuum Science and Technology B, 2003, 21(1): 280-287.
    [2] Izumi N, Snavely R, Gregori G, et al. Remington application of imaging plates to X-ray imaging and spectroscopy in laser plasma experiments[J]. Review of Scientific Instruments, 2006, 77(10): 325-1-325-5.
    [3] Rocca J J, Shlyaptsev V, Tomasel F G, et al. Demonstration of a discharge pumped table-top soft-X-ray laser[J]. Physical Review Letters, 1994, 73(6): 2192-2195.
    [4] Ben-Kish A, Shuker M, Nemirovsky R A, et al. Plasma dynamics in capillary discharge soft X-ray lasers[J]. Physical Review Letters, 2001, 87(1): 015002.
    [5] Niimi G, Hayashi Y, Nakajima M, Watanabe M, et al. Observation of multi-pulse soft X-ray lasing in a fast capillary discharge[J]. Journal of Physics D: Applied Physics, 2001, 34(14): 2123~2126.
    [6] Tan C A, Kwek K H. Development of a low current discharge-driven soft X-ray laser[J]. Journal of Physics D: Applied Physics, 2007, 40(16): 4787-4792.
    [7] Zhao Y P, Chen Y L, Wu Y C, et al. Effects of capillary discharge current on the time of lasing onset of soft X-ray laser at low pressure[J]. Journal of Physics D: Applied Physics, 2006, 39(2): 342-346.
    [8] Zhao Y P, Jiang S, Xie Y, et al. Demonstration of soft X-ray laser of Ne-like Ar at 69.8 nm pumped by capillary discharge[J]. Optics Letters, 2011, 36(17): 3458-3460.
    [9] Qu Yancheng, Ren Deming, Zhao Weijiang, et al. Experimental research on miniature folded cavity TEA CO2 Laser[J]. Infrared and Laser Engineering, 2007, 36(5): 632-634, 655. (in Chinese)
    [10] Shao Mingzhen, Shao Chunlei. Design of structure and optimization of flow field for mainframe of high power TEA CO2 Laser[J]. Infrared and Laser Engineering, 2012, 41(6):1508-1513. (in Chinese)
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Research of enhancing the output of capillary discharge-pumped Ne-like Ar 46.9 nm soft X-ray laser

  • 1. State Key Laboratory of Applied Optics,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China;
  • 2. National Key Laboratory of Science and Technology on Tunable Laser,Institute of Optical-electronics,Harbin Institute of Technology,Harbin 150080,China

Abstract: The observation of the capillary discharge-pumped Ne-like Ar 46.9 nm soft X-ray laser output was reported under the condition of pure Ar and gaseous mixture of Ar-He, Ar-Ne, Ar-N2 and Ar-Kr. Mixing Ar with an appropriate quantity of He, the laser output was enhanced evidently, and there was an optimum ratio of He in the gaseous mixture of Ar-He, which could be the best for laser output. The experimental results of Ar-Ne, Ar-N2 and Ar-Kr mixture show that Ne, N2 and Kr decrease the laser output. The source research of discharged produced plasma in extreme ultraviolet lithography also mixes an appropriate quantity of He, in order to enhance 13.5 nm.

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