Volume 42 Issue 1
Feb.  2014
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Fu Xiuhua, Yang Yongliang, Liu Guojun, Li Lin, Pan Yonggang, Ewan Waddell. Research of uniformity of diamond-like carbon on extensive head covering[J]. Infrared and Laser Engineering, 2013, 42(1): 181-184.
Citation: Fu Xiuhua, Yang Yongliang, Liu Guojun, Li Lin, Pan Yonggang, Ewan Waddell. Research of uniformity of diamond-like carbon on extensive head covering[J]. Infrared and Laser Engineering, 2013, 42(1): 181-184.

Research of uniformity of diamond-like carbon on extensive head covering

  • Received Date: 2012-05-22
  • Rev Recd Date: 2012-06-19
  • Publish Date: 2013-01-25
  • According to the special requirement of optical instrument to the uniformity of thin film thickness on infrared window, Femm42 software was adopted to analyze the potential in the vaccum of radio frequence plasma enhanced chemical vapor deposition system, by changing the height of DOME, and adding a metal ring behind the DOME, the problem of delamination on the edge of dome had solved. Taguchi experimental method was used to decrease times of experiment, at the same time, the secondary condition of effecting performance of thin film was found. The effects of the process parameters on the results of thin film thickness uniformity were analyzed. Finally, the optimal parameters had comfired. The DLC film that the uniformity is less 3% and can endure the bad environment test had successfully prepared.
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Research of uniformity of diamond-like carbon on extensive head covering

  • 1. School of Photo-electronic Engineering,Changchun University of Science and Technology,Changchun 130022,China;
  • 2. Thin Film Solutions Ltd,Block 7,West of Scotland Science Park,Glasgow G20 0TH,Scotland

Abstract: According to the special requirement of optical instrument to the uniformity of thin film thickness on infrared window, Femm42 software was adopted to analyze the potential in the vaccum of radio frequence plasma enhanced chemical vapor deposition system, by changing the height of DOME, and adding a metal ring behind the DOME, the problem of delamination on the edge of dome had solved. Taguchi experimental method was used to decrease times of experiment, at the same time, the secondary condition of effecting performance of thin film was found. The effects of the process parameters on the results of thin film thickness uniformity were analyzed. Finally, the optimal parameters had comfired. The DLC film that the uniformity is less 3% and can endure the bad environment test had successfully prepared.

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